Organic electroluminescence device and preparation method thereof
An electroluminescence device and luminescence technology, which is applied in the direction of electric solid-state devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of poor refractive index, total reflection loss, and low light-extraction performance, so as to improve light-extraction efficiency, Effect of improving stability and lowering potential barrier
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[0038] The preparation method of the organic electroluminescent device 100 according to an embodiment includes the following steps:
[0039] In step S110 , the scattering layer 20 is prepared by electron beam evaporation on the surface of the glass substrate 10 .
[0040] The scattering layer 20 is composed of a lithium salt material layer 201, a metal doped layer 202 and an iron salt material doped layer 203. The lithium salt material layer 201 is prepared on the surface of the glass substrate 10 by thermal resistance evaporation. The material of 201 is selected from lithium oxide (Li 2 At least one of lithium fluoride (LiF), lithium chloride (LiCl) and lithium bromide (LiBr), the metal doped layer 202 is prepared on the surface of the lithium salt material layer 201 by thermal resistance evaporation, so The metal doped layer 202 includes a first metal material and the luminescent material doped in the first metal material, the work function of the first metal material is -2...
Embodiment 1
[0061] The structure prepared in this example is glass substrate / LiCl / Ca:Alq 3 / FeCl 3 :Ag / ITO / MoO 3 / NPB / Alq 3 / TAZ / CsF / Ag organic electroluminescent device, in this embodiment and the following embodiments, " / " indicates a layer, and ":" indicates doping.
[0062] The glass substrate is N-LASF44. After rinsing the glass substrate with distilled water and ethanol, soak it in isopropanol for one night. Prepare the scattering layer on the glass substrate. The scattering layer is composed of lithium salt material layer, metal doped layer and iron salt material doped layer. The lithium salt material layer is prepared by thermal resistance evaporation on the surface of the glass substrate. The material is LiCl, and the thickness is 8nm, the metal doped layer is prepared by thermal resistance evaporation on the surface of the lithium salt material layer, and the material is Ca:Alq 3 , Ca and Alq 3 The mass ratio is 6:1, the thickness is 200nm, and the iron salt material doped ...
Embodiment 2
[0070] The structure prepared in this example is a glass substrate / Li 2 O / Mg:DCJTB / FeBr 3 :Al / IZO / MoO 3 / NPB / DCJTB / TPBi / Cs 2 CO 3 / Al organic electroluminescent devices.
[0071] The glass substrate is N-LAF36. After rinsing the glass substrate with distilled water and ethanol, soak it in isopropanol for one night to prepare a scattering layer on the glass substrate. The scattering layer is composed of lithium salt material layer, metal doped layer and iron salt Material doped layer composition, the lithium salt material layer is prepared by thermal resistance evaporation on the surface of the glass substrate, the material is Li 2 O, the thickness is 10nm, the metal-doped layer is prepared by thermal resistance evaporation on the surface of the lithium salt material layer, the material is Mg:DCJTB, the mass ratio of Mg and DCJTB is 1:1, the thickness is 300nm, on the surface of the metal-doped layer Electron beam evaporation is used to prepare the doped layer of iron salt...
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Abstract
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