A kind of polymer solar cell and preparation method thereof
A technology of solar cells and polymers, applied in circuits, photosensitive devices, photovoltaic power generation, etc., can solve the problems of low photoelectric conversion efficiency, high research and development costs, and low proportion, and achieve improved light absorption rate and energy conversion efficiency, Low cost, anti-oxidation effect
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Embodiment 1
[0055] A kind of polymer solar cell, preparation method comprises the following steps:
[0056] (1) The glass is subjected to photolithography treatment, cut according to the size of 2×2cm, and the illuminated area is 0.3×0.3cm. Sonicate with detergent, deionized water, acetone, ethanol, and isopropanol for 15 minutes each to remove the glass surface. Organic Pollutants;
[0057] (2) High vacuum coating equipment (Shenyang Scientific Instrument Development Center Co., Ltd., pressure -3 Pa) sequentially vapor-deposit cathode Al and electron buffer layer Cs 2 CO 3 , the pressure is 5×10 when evaporating the cathode -4 Pa, the evaporation rate is 5nm / s, and the thickness is 15nm; the pressure when evaporating the electron buffer layer is 5×10 -4 Pa, the evaporation rate is 0.2nm / s, and the thickness is 2nm;
[0058] (3) Then prepare the active layer: add 5mg P3HT and 4mg PCBM in 0.5ml chlorobenzene, stir and dissolve to obtain a mixed solution of P3HT and PCBM, the concentrat...
Embodiment 2
[0063] A kind of polymer solar cell, preparation method comprises the following steps:
[0064] (1) The glass is subjected to photolithography treatment, cut according to the size of 2×2cm, and the illuminated area is 0.3×0.3cm. Sonicate with detergent, deionized water, acetone, ethanol, and isopropanol for 15 minutes each to remove the glass surface. Organic Pollutants;
[0065] (2) High vacuum coating equipment (Shenyang Scientific Instrument Development Center Co., Ltd., pressure -3 Pa) sequentially vapor-deposit cathode Ag and electron buffer layer LiF, the pressure of vapor-deposition cathode is 5×10 -3 Pa, the evaporation rate is 10nm / s, the thickness is 10nm, and the pressure when evaporating the electron buffer layer is 5×10 -3 Pa, the evaporation rate is 1nm / s, and the thickness is 0.7nm;
[0066] (3) Then prepare the active layer: add 4.8mg P3HT and 19.2mg PCBM into 1ml chloroform, stir and dissolve to obtain a mixed solution of P3HT and PCBM, the concentration of ...
Embodiment 3
[0070] A kind of polymer solar cell, preparation method comprises the following steps:
[0071] (1) The glass is subjected to photolithography treatment, cut according to the size of 2×2cm, and the illuminated area is 0.3×0.3cm. Sonicate with detergent, deionized water, acetone, ethanol, and isopropanol for 15 minutes each to remove the glass surface. Organic Pollutants;
[0072] (2) High vacuum coating equipment (Shenyang Scientific Instrument Development Center Co., Ltd., pressure -3 Pa) sequentially vapor-deposit cathode Au and electron buffer layer Cs 2 CO 3 , the pressure is 2×10 when evaporating the cathode -5 Pa, the evaporation rate is 1nm / s, the thickness is 30nm, and the pressure when evaporating the electron buffer layer is 2×10 -5 Pa, the evaporation rate is 0.1nm / s, and the thickness is 0.5nm;
[0073] (3) Prepare active layer then: add 4mg P3HT and 12mg PCBM in 1ml chloroform, stir and dissolve to obtain P3HT and PCBM mixed solution, the concentration of P3HT...
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