Gas sensor based on OEFT (Organic field-effect transistor) and preparation method thereof
A gas sensor and transistor technology, which is used in instruments, scientific instruments, measuring devices, etc., can solve the problems of failing to meet the application requirements of OFET gas sensors and difficult to accurately control the grain size.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0030] Clean the substrate composed of transparent substrate and transparent conductive ITO, and dry it with nitrogen gas after cleaning; spin-coat shellac on the surface of transparent conductive cathode ITO: PMMA with a volume ratio of 10:90 grid insulating layer 100nm, and drying the formed film; evaporating 30 nm of pentacene organic semiconductor layer on the gate insulating layer; thermally evaporating 10 nm of gold source and drain electrodes on the organic semiconductor layer. The measured saturation current of the device (I SD )=70.33μA, threshold voltage (V TH )=-16V, large pentacene grains dominate, small grains are less, and there is no selectivity for oxidizing gas detection.
Embodiment 2
[0032] Clean the substrate composed of transparent substrate and transparent conductive ITO, and dry it with nitrogen gas after cleaning; spin-coat shellac on the surface of transparent conductive cathode ITO: a gate insulating layer with a PS volume ratio of 15:85 is 200nm, and drying the formed film; 60 nm of phthalocyanine organic semiconductor layer was evaporated on the gate insulating layer; 50 nm of silver source and drain electrodes were thermally evaporated on the organic semiconductor layer. The measured saturation current of the device (I SD )=67.88μA, threshold voltage (V TH )=-16V, the phthalocyanine crystal grains are dominated by large grains, and there are few small grains, so there is no selectivity for the detection of oxidizing gases.
Embodiment 3
[0034] Clean the substrate composed of transparent substrate and transparent conductive ITO, and dry it with nitrogen gas after cleaning; spin-coat shellac on the surface of transparent conductive cathode ITO: a gate insulating layer with a volume ratio of 20:80 of 300nm, and drying the formed film; evaporating 90nm of fullerene organic semiconductor layer on the gate insulating layer; thermally evaporating 80nm of copper source electrode and drain electrode on the organic semiconductor layer. The measured saturation current of the device (I SD )=65.19μA, threshold voltage (V TH )=-16V, there are more large grains of fullerene and less small grains. The selective detection contrast of nitrogen dioxide, sulfur dioxide and sulfur trioxide is poor.
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 