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storage container

A container and storage technology, which is used in the manufacture of instruments, semiconductor/solid-state devices, packaging, etc., can solve the problems of different purge gas atmosphere, uneven flow rate of purge gas, etc., and achieve the effect of uniform flow rate

Active Publication Date: 2019-12-10
MURATA MASCH LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, in the storage container, the flow velocity of the purge gas becomes non-uniform, and as a result, there is a possibility that the atmosphere of the purge gas in the storage unit may vary.

Method used

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Embodiment Construction

[0024] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. In addition, in the description of the drawings, the same reference numerals are assigned to the same or corresponding elements, and overlapping descriptions will be omitted.

[0025] figure 1 It is a front view of the storage container of one embodiment. figure 2 Yes figure 1 Side view of the storage container shown. image 3 Yes figure 1 Bottom view of the storage container shown. Figure 4 Yes figure 1 A top view of the storage container shown. The storage container 1 shown in each figure is, for example, a container for storing a reticle (item) in a clean atmosphere. In addition, the items stored in the storage container 1 are not limited to reticles.

[0026] The storage container 1 includes a bottom portion 3 , a storage portion 5 , and a lid portion 7 . The storage unit 5 is stacked up and down in multiple layers (11 in this case). In...

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PUM

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Abstract

The present invention provides a storage container capable of uniformizing the flow rate of purge gas. The storage container (1) is formed by multiple layers of storage parts (5) having a storage area (S) for storing articles, is provided with a supply part (10) for supplying a purge gas, and is provided in communication across the plurality of storage parts (5). And it becomes the duct part (22) which is the flow path of the purge gas supplied from the supply part, and the introduction part which connects the duct part (22) and the storage area (S) and introduces the purge gas into the storage area (S). (24), a diffusion member (32) is arranged in the flow path of the purge gas in the duct portion (22).

Description

technical field [0001] The present invention relates to storage containers. Background technique [0002] A reticle used for exposure of semiconductors and the like needs to be kept clean in order to protect it from dust and dust during transportation and storage. Therefore, a purge gas (cleaning gas) is supplied into the storage container for storing the reticle (for example, refer to Patent Document 1). [0003] Patent Document 1: Japanese Patent No. 4215079 [0004] The storage container has a structure in which storage sections for storing reticles are stacked up and down in multiple layers. In such a storage container, the purge gas is generally supplied inside from a supply unit at one position, and the purge gas is supplied to each storage unit through flow paths provided throughout the upper and lower sides. In this case, in the storage container, the flow velocity of the purge gas is fast at a portion close to the supply portion, and the flow velocity of the purg...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/66B65D85/86H01L21/027H01L21/673
CPCG03F1/66H01L21/67346H01L21/67359H01L21/67393
Inventor 雁部政彦
Owner MURATA MASCH LTD