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A kind of manufacturing method of impact-resistant three-dimensional graphene film

A graphene film and a manufacturing method technology, applied in nanotechnology, ion implantation plating, gaseous chemical plating and other directions for materials and surface science, can solve the problems that existing materials are difficult to meet application requirements, and reach the scope of application wide range of effects

Inactive Publication Date: 2017-12-01
湖南元素密码石墨烯高科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The supply and demand pattern and consumption structure of flat glass are changing, and the existing materials are difficult to meet the application requirements

Method used

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  • A kind of manufacturing method of impact-resistant three-dimensional graphene film
  • A kind of manufacturing method of impact-resistant three-dimensional graphene film
  • A kind of manufacturing method of impact-resistant three-dimensional graphene film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Such as figure 1 and figure 2 Shown: the present embodiment makes a kind of manufacturing method of impact-resistant three-dimensional graphene film with ECR-CVD method as follows:

[0030] In this embodiment, a 6-inch ceramic substrate 8 is selected, and a square network three-dimensional structure layer 9 (length×width×height=1.5 μm×1.5μm×200nm); the single-layer graphene powder is adsorbed on the surface of the square network three-dimensional structure layer 9, and fixed on the workbench 5 along with the ceramic substrate 8, using the ECR-CVD deposition source 1 and using Working gas CH in the combined gas cabinet 7 4 、H 2 To finish depositing a 0.1 μm diamond-like carbon (DLC) film on the surface of the ceramic substrate 8 .

[0031] 1. System feeding and high vacuum

[0032] Fix the 6-inch ceramic substrate 8 with a single-layer graphene powder with a surface adsorption of 85% distribution density on the workbench 5, close the feeding door, start the vacuum ...

Embodiment 2

[0035] Such as figure 1 and image 3 Shown: the preparation method of making 6 layers of impact-resistant three-dimensional graphene film with the single-layer impact-resistant three-dimensional graphene film that the present embodiment makes is as follows:

[0036]In this embodiment, the single-layer impact-resistant three-dimensional graphene film made in Example 1 is selected, and a square network three-dimensional structure layer 9 (length × Width × height = 1.5 μm × 1.5 μm × 200nm); the single-layer graphene powder is adsorbed on the surface of the square network three-dimensional structure layer 9, and fixed on the workbench 5 with the ceramic substrate 8, using ECR-CVD Deposition source 1 and use the working gas CH in the combined gas cabinet 7 4 、H 2 To finish depositing a 0.1 μm diamond-like carbon (DLC) film on the surface of the ceramic substrate 8 .

[0037] 1. System feeding and high vacuum

[0038] Fix the ceramic substrate 8 of the single-layer graphene pow...

Embodiment 3

[0043] Such as figure 1 Shown: the present embodiment makes a kind of making method of impact-resistant three-dimensional graphene film with RF-CVD method as follows:

[0044] In this embodiment, a 5-inch plastic substrate is selected, and a rectangular network three-dimensional structure layer (length × width × height = 400nm × 200nm × 100nm); the single-layer graphene powder is adsorbed on the surface of the rectangular network three-dimensional structure layer, and fixed on the workbench 5 along with the plastic substrate, using the RF-CVD deposition source 2 and the work in the combined gas cabinet 7 Gas CH 4 、H 2 To complete the deposition of a 0.05 μm silicon carbide (SiC) film on the surface of the plastic substrate.

[0045] 1. System feeding and high vacuum

[0046] Fix the plastic base material of the single-layer graphene powder whose surface absorbs 90% distribution density on the workbench 5, close the feeding door, start the vacuum pumping unit 6, and wait un...

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Abstract

The invention discloses a manufacturing method for an impact-resistant three-dimensional graphene thin film. The manufacturing method comprises the following steps that (1) a substrate is chosen from ceramic, metal or a nonmetal substrate plate, a nano-sized meshy stereochemical structure layer arranged in order is prepared on the surface of the substrate through a nano coining process, and graphene powder is evenly distributed on the surface of the meshy stereochemical structure layer; (2) in the vacuum work environment, at least one material thin film is deposited on the surface of the graophene powder through a deposition method, and a continuous composite thin film is formed among the deposited material thin film, the graphene powder, the meshy stereochemical structure layer and the substrate; and (3) the step (1) and the step (2) are repeated for multiple times, and finally the impact-resistant three-dimensional graphene thin film is formed through hot pressing forming. The impact-resistant three-dimensional graphene thin film prepared through the manufacturing method has the combination properties such as high light-admitting property, high impact resistance, abrasion resistance, weather resistance, thermal diffusivity and electrical conductivity, and is broad in application range.

Description

technical field [0001] The invention relates to a method for manufacturing a graphene film, in particular to a method for manufacturing an impact-resistant three-dimensional graphene film. Background technique [0002] Since the 19th century, with the increasing use of guns and cannons, cold weapons such as knives, swords, and crossbows have gradually faded out of the historical stage of warfare, and the protection of individuals has gradually changed from anti-stab (cut) to anti-bullet (fragmentation). )s damage. Personal protective materials have experienced the development from natural plant fibers to metal materials to high-strength synthetic materials. In the development history of modern bulletproof materials, the period from 1970s to 1980s is a milestone period. In 1972, DuPont of the United States launched a commercial product of para-aramid fiber - Kevlar; in 1986, after United Signal Corporation of the United States obtained the patent license of DSM Company of t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/22C23C16/44C23C16/01B82Y40/00B82Y30/00
Inventor 谭彬兰育辉
Owner 湖南元素密码石墨烯高科技有限公司
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