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Resist stripper composition, method for producing flat panel display, and flat panel display

A technology of resist stripper and flat panel display, applied in the direction of photosensitive material processing, etc., can solve the problems of residual anti-corrosion agent, prolonging stripping time, discoloration of resist stripper composition and deterioration of stripping performance, etc.

Active Publication Date: 2019-10-25
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, there is a high possibility of resist remaining on the wiring after the stripping process
In addition, the presence of these anti-corrosion agents may cause discoloration of the resist stripper composition in long-term storage and deterioration of stripping performance, such as prolonging the stripping time

Method used

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  • Resist stripper composition, method for producing flat panel display, and flat panel display
  • Resist stripper composition, method for producing flat panel display, and flat panel display
  • Resist stripper composition, method for producing flat panel display, and flat panel display

Examples

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Embodiment 1 to Embodiment 10 and comparative example 1 to comparative example 5

[0073] Example 1 to Example 10 and Comparative Example 1 to Comparative Example 5: Preparation of resist stripper composition

[0074] A resist stripper composition was prepared with the ingredients shown in Table 1 below.

[0075] Table 1

[0076] (Unit: wt%)

[0077]

[0078] Note): MTBT: 4-methyl-4,5,6,7-tetrahydro-1H-benzo[1,2,3]triazole

[0079] DMTBT: 5,6-Dimethyl-4,5,6,7-tetrahydro-1H-benzo[1,2,3]triazole

[0080] MDEA: N-Methyldiethanolamine

[0081] DMEA: N,N-Dimethylethanolamine

[0082] TEA: Triethanolamine

[0083] AEE: 2-(2-Aminoethoxy)ethanol

[0084] EDG: Diethylene glycol monoethyl ether

[0085] MDG: Diethylene glycol monomethyl ether

[0086] NMF: N-Methylformamide

[0087] NEF: N-ethylformamide

[0088] DMPA: N,N-Dimethylpropanamide

[0089] NMP: N-Methylpyrrolidone

[0090] THFA: tetrahydrofurfuryl alcohol

[0091] HMDM: 4-Hydroxymethyl-2,2-dimethyl-1,3-dioxolane

[0092] BTA: Benzotriazole

[0093] tBMP: t-Butyl-4-methoxyphenol

[0094] ...

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Abstract

The present invention discloses a corrosion inhibitor stripping agent composition, comprising: a compound (A) represented by a chemical formula 1; an alkanolamine (B) comprising a primary alkanolamine and a tertiary alkanolamine; a primary alcohol (C); and a polar aprotic solvent (D). The present invention also discloses a method for manufacturing a flat-panel display plate, and a flat-panel display plate.

Description

technical field [0001] The present invention relates to a resist stripper composition. More specifically, the present invention relates to a resist stripper composition, a method for manufacturing a flat panel display substrate using the resist stripper composition, and a flat panel display substrate manufactured by the method, wherein the resist stripper composition exhibits excellent stripping capability while minimizing corrosion to metal wiring during resist stripping. Background technique [0002] As demand for high-resolution flat panel displays has increased, efforts have been made to increase the number of pixels per unit area, for example, to reduce the width of wiring through harsh manufacturing procedures such as dry etching processes. Furthermore, expanding the flat panel display requires increasing the speed of signal transmission in the wiring, which is achieved by using copper as the wiring material because copper has a lower resistivity than aluminum. There...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42
Inventor 金正铉高京俊李喻珍金圣植
Owner DONGWOO FINE CHEM CO LTD
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