A kind of solar spectrum selective absorption coating and preparation method thereof
A technology of absorbing coating and solar spectrum, which is applied in the field of solar thermal utilization, can solve the problems of unsatisfactory thermal aging test and salt spray test results, high emissivity, etc., and achieve high temperature resistance, excellent optical performance, and good weather resistance Effect
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Embodiment 1
[0032] In Mo / Mo x Al 1-x o y N 1-y / AlON / SiON spectral selective absorption coating as an example, the preparation steps are as follows:
[0033] Step 1: Prepare a metal infrared high reflective layer; use a metal Mo target (purity of 99.99%) DC magnetron sputtering method to pre-evacuate the vacuum chamber to 1.0×10 -3 pa, feed Ar with a purity of 99.999% as the sputtering gas, the flow rate is 180sccm, and the sputtering pressure is adjusted to 4.5×10 -1 pa. Turn on the Mo target with a power of 20KW and sputter for 10min to prepare a 100nm Mo film.
[0034] Step 2: Prepare the absorbing layer; select a Mo target with a purity of 99.99% and an Al target with a purity of 99.99%, feed Ar with a purity of 99.999% as the sputtering gas, fix the Ar flow rate at 180 sccm, and feed the Ar with a purity of 99.999%. N 2 As a reaction gas, the fixed flow rate is 100 sccm, and the purity of 99.999% O 2 As a reactive gas, the flow rate is gradually increased from 0 to 30 sccm. ...
Embodiment 2
[0039] in W / W x Al 1-x o y N 1-y / AlN / Al 2 o 3 / SiON spectral selective absorption coating as an example, the preparation steps are as follows:
[0040] Step 1: Prepare a metal infrared high reflective layer; use a metal W target (purity of 99.99%) DC magnetron sputtering method to pre-evacuate the vacuum chamber to 1.0×10 -3 pa, feed Ar with a purity of 99.999% as the sputtering gas, the flow rate is 180sccm, and the sputtering pressure is adjusted to 4.5×10 -1 pa. Turn on the W target with a power of 20KW and sputter for 15 minutes to prepare a 150nm W film.
[0041] Step 2: Prepare the absorbing layer; select a W target with a purity of 99.99% and an Al target with a purity of 99.99%, feed Ar with a purity of 99.999% as the sputtering gas, fix the Ar flow rate at 180 sccm, and feed the Ar with a purity of 99.999%. N 2 As a reaction gas, the fixed flow rate is 120 sccm, and the purity of 99.999% O 2 As a reactive gas, the flow rate was gradually increased from 0 to...
Embodiment 3
[0046] In Mo / Mo x Al 1-x o y N 1-y / Al 2 o 3 / Si 3 N 4 Taking the spectrally selective absorbing coating as an example, the preparation steps are as follows:
[0047] Step 1: Prepare a metal infrared high reflective layer; use a metal Mo target (purity of 99.99%) DC magnetron sputtering method to pre-evacuate the vacuum chamber to 1.0×10 -3 pa, feed Ar with a purity of 99.999% as the sputtering gas, the flow rate is 180sccm, and the sputtering pressure is adjusted to 4.5×10 -1 pa. Turn on the Mo target with a power of 20KW and sputter for 20min to prepare a 200nm Mo film.
[0048] Step 2: Prepare the absorbing layer; select a Mo target with a purity of 99.99% and an Al target with a purity of 99.99%, feed Ar with a purity of 99.999% as the sputtering gas, fix the Ar flow rate at 180 sccm, and feed the Ar with a purity of 99.999%. N 2 As a reaction gas, the fixed flow rate is 120 sccm, and the purity of 99.999% O 2 As a reactive gas, the flow rate was gradually incr...
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