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A film system for correcting the relative thickness ratio of high and low refractive index materials in thin films

A technology of high and low refractive index and relative thickness, which is applied in the field of optical thin films, can solve problems such as the mismatch of thickness ratio between high and low refractive index materials, and unsatisfactory uniformity of the film layer, so as to achieve many characteristic peaks of the reference spectrum, convenient judgment and correction, and film The effect of simple structure

Active Publication Date: 2018-08-24
TONGJI UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in the process of thin film preparation, there may be problems of unsatisfactory film uniformity and mismatching thickness ratio of high and low refractive index materials. There are many researches on film uniformity, mainly including two aspects: one is in the same plating process The films in different positions of the coating machine workpiece rack should have the same film thickness distribution; the second is the same optical element, the properties of the film on the substrate should be the same everywhere

Method used

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  • A film system for correcting the relative thickness ratio of high and low refractive index materials in thin films
  • A film system for correcting the relative thickness ratio of high and low refractive index materials in thin films
  • A film system for correcting the relative thickness ratio of high and low refractive index materials in thin films

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Embodiment 1

[0020] It is necessary to prepare a dual-cavity narrow-band filter element with a half-width of less than 6nm and a diameter of 200mm×200mm. Due to the symmetrical structure of its film system, the requirements for the thickness ratio of high and low refractive index materials are extremely strict. At the same time, for such a large-sized narrow-band filter Spectral uniformity over the entire size of the light sheet is also extremely demanding. For this reason, first use the film structure SUB|HL1.5HLHL1.5HL|AIR mentioned in this design to simultaneously correct the thickness ratio of hafnium oxide and silicon oxide thin film elements, where SUB is the quartz substrate, and H is HfO 2 , L is SiO 2 . Its spectral curve is as figure 1 As shown, the design wavelength is 1550nm, and there are three main characteristic peaks. These three peaks can be used to characterize and judge the deviation and uniformity of the overall thickness of the thin film element and the ratio of high...

Embodiment 2

[0023] In the laser system, there is a demand for wide-angle and ultra-high-steep films. For example, a film needs to be coated on a 100mm×100mm quartz substrate, the incident angle range is 0-14°, and the spectrum requirement is T90%@1064nm-1100nm. This film system has two characteristics, one is that the cut-off degree is very high, and the other is that it is not sensitive to angle. This film system needs to control the thickness preparation precision of high and low refractive index extremely accurately, otherwise the cut-off degree cannot meet the requirements. At the same time, the size of 100mm×100mm also puts forward extremely high requirements on the control of the overall thickness uniformity of the film. In the actual preparation process, first use the film structure SUB|HL1.5HLHL1.5HL|AIR mentioned in this design to simultaneously correct the thickness ratio of hafnium oxide and silicon oxide thin film elements, where SUB is the quartz substrate, and H is HfO 2 ,...

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Abstract

The invention relates to a film system for correcting a thin film high and low refraction index material relative thickness ratio. The film system has a basic structure of Sub|HL1.5HLHL1.5HL|Air, Sub is a thin film element substrate, Air is exit medium air, and H and L are respectively high and low refractive index materials with optical thickness being one fourth of central wavelength. A thin film element adopting a film system structure has many transmission spectrum characteristic peaks, and two equally high characteristic peaks positioned at a right side of a central wavelength reflection band are used for correcting the high and low material relative film thickness ratio. The film system is advantageous in that the film system is simple in structure, many optical spectrum characteristic peaks are available for reference, peak height is sensitive to a material ratio, optical spectrums can be realized via conventional optical monitoring or crystal oscillator monitoring, and the film system can be made with great feasibility and suitable for popularization. The film system has broad practical prospects in the field of thin film optics and can be used for correcting thickness uniformity of an inner film layer of a film plating machine and uniformity of whole thickness of a large-sized optical element, the film system can also be used for correcting the high and low refractive index film layer material relative thickness ratio, and manufacture accuracy and mass production of thin-film elements having high-precision spectrum requirements can be improved.

Description

technical field [0001] The invention relates to an optical thin film, in particular to a film system for correcting the relative thickness ratio of high and low refractive index materials during preparation of a thin film element. Background technique [0002] Since thin films were manufactured and used in the early 19th century, generations of scientists have conducted in-depth research on the theory, preparation process, materials and application fields of thin films, and gradually formed a relatively complete optical thin film system. Now thin-film technology is widely used in high-tech industries such as electronic components, lasers, and aerospace, and thin-film technology is increasingly affecting the performance of its products, and has become an important technology in high-tech industries. However, in the process of film preparation, there may be problems of unsatisfactory film uniformity and mismatching of the thickness ratio of high and low refractive index materi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/10G02B27/00
CPCG02B1/10G02B27/0012
Inventor 焦宏飞何宇鲍刚华马彬程鑫彬王占山李刚正孙英会
Owner TONGJI UNIV