LED chip and manufacturing method therefor
A technology of LED chips and manufacturing methods, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of easy falling off of P electrodes, low surface roughness of ITO layer, easy falling off of edges of P electrodes, etc. The effect of great stability
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[0070] ginseng Figure 5a , 5b As shown, the LED chip in a specific embodiment of the present invention includes from bottom to top:
[0071] Substrate 10, the substrate can be sapphire, Si, SiC, GaN, ZnO, etc.;
[0072] N-type semiconductor layer 20, the N-type semiconductor layer can be N-type GaN, etc., and N-type mesa 21 is formed on the N-type semiconductor layer;
[0073] A light-emitting layer 30, the light-emitting layer can be GaN, InGaN, etc.;
[0074] P-type semiconductor layer 40, the P-type semiconductor layer can be P-type GaN, etc.;
[0075] A current blocking layer 50 (CBL layer) located on the P-type semiconductor layer 40, and a current diffusion layer 60 (TCL layer) located on the P-type semiconductor layer 40 and covering the current blocking layer 50, wherein there is no opening in the current blocking layer 50 holes, the current spreading layer 60 is provided with through holes;
[0076] The P electrode 71 located above the P-type semiconductor layer...
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