Wet-peelable silicon-containing antireflective agents
A technology of siloxane and polymer used in the field of anti-reflective composition, which can solve the problem of not providing etch resistance
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example 1
[0049] Example 1: Preparation of Polymer 1. 3-neck round bottom flask equipped with thermocouple, magnetic stir bar, N 2 Feed lines, bubbler, and heated oil bath. Dihydrofuran-2,5-diketopropyltriethoxysilane (9.13g, 30mmol), mercaptopropyltrimethoxysilane (5.89g, 30mmol), tetramethyldiethoxydisiloxane (16.68 g, 75 mmol) and diphenyldiethoxysilane (4.08 g, 15 mmol) were measured by weight and charged into a reactor using PGMEA (10 g, 0.32 volume relative to total monomer weight) to facilitate transfer . In separate vessels, acetic acid (0.575 g, 9.57 mmol) and deionized water (14.04 g, 788 mmol) were measured by weight and mixed together. The resulting aqueous acetic acid solution was charged to the reactor at ambient temperature. A biphasic mixture was obtained after the addition. The batch was stirred for 30 minutes at ambient temperature. A slight exothermic effect was observed (batch temperature increased from 22°C to 26°C and stabilized during the first 15 minutes of...
example 2
[0053] Example 2: Preparation of Polymer 2. 3-neck round bottom flask equipped with thermocouple, magnetic stir bar, N 2Feed lines, bubbler, and heated oil bath. Dihydrofuran-2,5-dioxopropyltriethoxysilane (9.13g, 30mmol), mercaptopropyltrimethoxysilane (5.89g, 30mmol), methylmercaptopropyldiethoxysilane ( 13.53 g, 75 mmol) and methylphenyldiethoxysilane (2.73 g, 15 mmol) were measured by weight and charged to the reactor using PGMEA (10 g, 0.32 volume relative to total monomer weight) to facilitate transfer . In a separate vessel, acetic acid (0.575 g, 9.57 mmol) and deionized water (14.2 g, 788 mmol) were measured by weight and mixed together. The resulting aqueous acetic acid solution was charged to the reactor at ambient temperature. A biphasic mixture was obtained after the addition. The batch was stirred for 30 minutes at ambient temperature. A slight exothermic effect was observed where the batch temperature increased from 22 to 26°C and stabilized during the fir...
example 3
[0057] Example 3: Preparation of Polymer 3. The procedure of Example 1 was repeated, but wherein 30 mmol of methylglycidyloxypropyldiethoxysilane was used instead of mercaptopropyltrimethoxysilane and an appropriate amount of methylphenyldimethoxysilane was used instead of diphenyl Diethoxysilane to provide polymer 3 shown below, where "R" refers to ethyl, methyl or H. Polymer 3 M w is 1376 Da and has a silicon content of 26% by weight.
[0058] Polymer 3:
[0059]
PUM
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