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Mask pellicle indicator for haze prevention

An indicator and mask technology, applied in the field of conductors, can solve problems such as wafer printing errors

Active Publication Date: 2019-12-20
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Mask haze can cause printing errors on wafers

Method used

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  • Mask pellicle indicator for haze prevention
  • Mask pellicle indicator for haze prevention
  • Mask pellicle indicator for haze prevention

Examples

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Embodiment Construction

[0013] The following disclosure provides many different embodiments, or examples, for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. Of course, these are examples only and are not intended to be limiting. In addition, the present invention may repeat reference numerals and / or letters in various instances. This repetition is for simplicity and clarity and does not in itself indicate a relationship between the various embodiments and / or configurations discussed. Furthermore, representations of a first process before a second process in the following description may include embodiments in which the second process is performed immediately after the first process, and may also include embodiments in which additional processes may be performed between the first and second processes Example. Various features may be arbitrarily extruded in different proportions ...

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Abstract

A pellicle mask assembly includes a mask, a pellicle frame, and a pellicle membrane. The pellicle frame has a bottom side attached to the mask, and a top side covered by the pellicle membrane. The pellicle frame includes a coating on its inner surface and the coating is configured to monitor a change of environment inside the pellicle mask assembly. In embodiments, the change of environment includes increased humidity and / or increased chemical ion density inside the pellicle mask assembly. Methods of making and using the pellicle mask assembly are also disclosed.

Description

technical field [0001] The present invention relates to the field of conductors, and more particularly, to a mask surface film indicator for preventing haze. Background technique [0002] In semiconductor technology, a mask (photomask or reticle) is formed with a predesigned pattern of an integrated circuit (IC). The mask is used to transfer those pre-designed IC patterns to the semiconductor wafer during the photolithography process. Any defects on the mask will be transferred to the semiconductor wafer and cause yield issues and quality concerns. Additionally, particle contamination is a source of mask defects. [0003] One type of particle contamination is mask haze, which can be introduced during mask fabrication, handling, or photolithography processes. For example, chemicals such as SO 2 and / or NH 3 ) can be vented during the mask fabrication process. Despite some cleanup procedures, these chemicals persist on the surface of the mask during a lithography exposure...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/82
CPCG03F1/62G03F1/64G03B27/62G03B27/6242G03B27/625
Inventor 林冠文秦圣基许庭豪周子婷吴书贤
Owner TAIWAN SEMICON MFG CO LTD