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Functional ceramic material surface patterning method

A technology of surface graphics and functional ceramics, which is applied in the field of surface graphics, can solve the problems of limited types of ceramic materials, low ceramic output, complex process, etc., and achieve the effect of obvious graphic features

Active Publication Date: 2017-02-01
SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The above-mentioned method 1 has a complicated process, and dry etching has a low output of ceramics; method 2 has limited types of ceramic materials that can be deposited due to the deposition process and the low tolerance of the barrier layer to temperature, and the common deposition method lower output

Method used

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  • Functional ceramic material surface patterning method
  • Functional ceramic material surface patterning method
  • Functional ceramic material surface patterning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0063] 1. Weigh 0.3g of PMMA with a relative molecular weight of 99K and dissolve it with acetone to make its mass concentration 8%;

[0064] 2. Weigh 1.5g of ZrO with a particle size of 50 nm 2 Particles, 20ml of acetone was added thereto to obtain a nanoparticle suspension, stirred, and then 0.15g of glycidyloxypropyltrimethoxysilane was added, and the suspension was heated at 100°C for 1 hour in a closed container;

[0065] 3. Add the nano-imprinting glue solution in step 1 into the nanoparticle suspension, heat and stir at 200°C to evaporate the solvent, and obtain ceramic nano-imprinting glue;

[0066] 4. Take 50mg of ceramic nanoimprint glue on 1cm 2 On the silicon wafer substrate, stack the silicon wafer of the same size that has undergone anti-adhesive treatment on it, place it in a nano-imprinting machine and raise the temperature to 175°C and pressurize to 40MPa, remove it immediately and then demould after cooling;

[0067] 5. Stack the anti-adhesive-treated nano-...

Embodiment 2

[0071] 1. Weigh 0.3g of PMMA with a relative molecular weight of 99K and dissolve it with acetone to make its mass concentration 8%;

[0072] 2. Weigh 1.5g of ZrO with a particle size of 50 nm 2 Particles, 20ml of acetone was added thereto to obtain a nanoparticle suspension, stirred, and then 0.3g of glycidyloxypropyltrimethoxysilane was added, and the suspension was heated at 100°C for 1 hour in a closed container;

[0073] 3. Add the nano-imprinting glue solution in step 1 into the nanoparticle suspension, heat and stir at 200°C to evaporate the solvent, and obtain ceramic nano-imprinting glue;

[0074] 4. Take 50mg of ceramic nanoimprint glue on 1cm 2 On the silicon wafer substrate, stack the silicon wafer of the same size that has undergone anti-adhesive treatment on it, place it in a nano-imprinting machine and raise the temperature to 175°C and pressurize to 40MPa, remove it immediately and then demould after cooling;

[0075] 5. Stack the anti-adhesive-treated nano-i...

Embodiment 3

[0079] 1. Weigh 0.3g of PMMA with a relative molecular weight of 99K and dissolve it with acetone to make its mass concentration 8%;

[0080] 2. Weigh 1.5g of ZrO with a particle size of 50 nm 2 Particles, 20ml of acetone was added thereto to obtain a nanoparticle suspension, stirred, and then 0.3g of glycidyloxypropyltrimethoxysilane was added, and the suspension was heated at 100°C for 1 hour in a closed container;

[0081] 3. Add the nano-imprinting glue solution in step 1 into the nanoparticle suspension, heat and stir at 200°C to evaporate the solvent, and obtain ceramic nano-imprinting glue;

[0082] 4. Take 50mg of ceramic nanoimprint glue on 1cm 2 On the silicon wafer substrate, stack the silicon wafer of the same size that has undergone anti-adhesive treatment on it, place it in a nano-imprint machine and raise the temperature to 175°C and pressurize to 40MPa, remove it immediately and then demould after cooling;

[0083] 5. Stack the anti-adhesive nano-imprint temp...

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Abstract

The invention discloses a functional ceramic material surface patterning method. The method comprises 1, adding a thermoplastic nano-imprint resist into a solvent to obtain a nano-imprint resist solution, 2, adding nanoparticles into a solvent to obtain a nanoparticle fluid suspension, 3, adding a modifier into the nanoparticle fluid suspension and carrying out dispersion, 4, adding the nano-imprint resist solution into the nanoparticle fluid suspension and volatilizing the solvent to obtain a ceramic nano-imprint resist, 5, carrying out surface patterning on the ceramic nano-imprint resist through a nano-imprint technology and 6, sintering the ceramic nano-imprint resist subjected to surface patterning at a high temperature. The method is free of an etching process and realizes obvious patterning characteristics on the ceramic surface subjected to high temperature calcining.

Description

technical field [0001] The invention belongs to the field of surface patterning, and in particular relates to a method for surface patterning of functional ceramic materials by using nano-imprint technology. Background technique [0002] Ceramics are an inorganic material that is covalently bonded by metal and nonmetal (or metalloid) elements with ionic bonds. Ceramics are generally divided into two categories, traditional ceramics and functional ceramics. Functional ceramic materials usually have the characteristics of high melting point, high hardness, low electrical conductivity, high elastic modulus, chemical stability and low ductility, and some materials have piezoelectric and superconducting properties. Due to the wide range of optional basic elements, a variety of functional ceramic materials with different characteristics have been synthesized both in industry and in laboratories. These functional ceramic materials can be conveniently divided into structural ceram...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/48C04B35/634
CPCC04B35/48C04B35/63424C04B35/63464C04B2235/48C04B2235/483C04B2235/5454C04B2235/658
Inventor 程鑫孙大陟余波李丹丹
Owner SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA