Photoelectron semiconductor device manufacturing method
A technology for optoelectronic semiconductors and manufacturing methods, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as failure, difficulty in capturing, deviation of detection results, etc., to improve accuracy, ensure reliability, and prevent mutual the effect of interference
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[0018] see figure 1 and 2 , the optoelectronic semiconductor device according to the invention has an injection-molded housing, a radiation-emitting semiconductor chip 2 and a plurality of radiation-detecting semiconductor chips 3 , wherein a first cavity and a second cavity are formed in the injection-molded housing, the first A cavity is a cylindrical cavity surrounded by the inner wall 4 and the bottom wall, and the second cavity is an annular cavity surrounding the first cavity surrounded by the outer wall 5 and the bottom wall; A plurality of electrically conductive carriers 1 of a radiation-emitting semiconductor chip 2 and a plurality of radiation-detecting semiconductor chips 3 as well as a plurality of electrode pads 10 .
[0019] The radiation-emitting semiconductor chip 2 has an active layer suitable for generating radiation and the radiation-emitting semiconductor chip 2 is arranged in the first chamber by carrying a conductive carrier 1 electrically connected in ...
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