Supporting substrate with inorganic film, glass laminate, method for producing them, and method for producing electronic device
A technology for supporting substrates and manufacturing methods, which is applied in the direction of electronic equipment, electric solid-state devices, semiconductor devices, etc., can solve the problems of reduced handling and insufficient strength of glass substrates, and achieve the effects of suppressing air bubbles and good adhesion
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Embodiment 1
[0164] A glass plate (AN100 manufactured by Asahi Glass Co., Ltd.) made of alkali-free borosilicate glass having a thickness of 300×300 mm and a thickness of 0.5 mm was prepared as a glass plate to be a supporting substrate.
[0165] While heating the surface of the glass plate to about 580° C., hydrogen fluoride gas was blown to roughen the surface.
[0166] AFM (manufactured by Hitachi High-Technologies Corporation, SPA400) for the surface roughness Ra of the surface of the roughened glass plate, and the difference in peak height between 0% and 10% of the load length ratio of the load curve (hereinafter also referred to as The assay was performed as "Sdc (0-10%)").
[0167] As a result, the surface roughness Ra was 16 nm, and Sdc (0-10%) was 79 nm.
[0168] As a glass substrate, a glass plate (AN100 manufactured by Asahi Glass Co., Ltd.) made of alkali-free borosilicate glass having a thickness of 300×300 mm and a thickness of 0.2 mm was prepared.
[0169] The roughened gl...
Embodiment 2
[0176] As a supporting substrate, a glass plate (AN100 manufactured by Asahi Glass Co., Ltd.) made of alkali-free borosilicate glass having a thickness of 300×300 mm and a thickness of 0.5 mm was prepared.
[0177] On the surface of this supporting substrate, a film of indium tin oxide having a thickness of 450 nm was formed as a flat film by sputtering.
[0178] In the same manner as in Example 1, the surface roughness Ra and Sdc (0-10%) of the surface of the flat film were measured. As a result, the surface roughness Ra was 6.6 nm, and Sdc (0-10%) was 21 nm.
[0179] As a glass substrate, a glass plate (AN100 manufactured by Asahi Glass Co., Ltd.) made of alkali-free borosilicate glass having a thickness of 300×300 mm and a thickness of 0.2 mm was prepared.
[0180] The support substrate on which the flat film was formed and the glass substrate were sufficiently cleaned, and both were laminated by contacting the flat film surfaces, but the support substrate and the glass su...
Embodiment 3
[0186] A glass plate (AN100 manufactured by Asahi Glass Co., Ltd.) made of alkali-free borosilicate glass having a thickness of 300×300 mm and a thickness of 0.5 mm was prepared as a glass plate to be a supporting substrate.
[0187] While heating the surface of the glass plate to about 580° C., hydrogen fluoride gas was blown to roughen the surface to prepare a supporting substrate.
[0188] In the same manner as in Example 1, the surface roughness Ra and Sdc (0-10%) of the surface of the supporting substrate were measured. As a result, the surface roughness Ra was 16 nm, and Sdc (0-10%) was 79 nm.
[0189] As a glass substrate, a glass plate (AN100 manufactured by Asahi Glass Co., Ltd.) made of alkali-free borosilicate glass having a thickness of 300×300 mm and a thickness of 0.2 mm was prepared.
[0190] The support substrate and the glass substrate were sufficiently cleaned, and both were laminated by bringing the roughened surfaces into contact, but the support substrate...
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