Thin-film thermocouple and temperature sensor containing same
A thermocouple and thin-film technology, applied in the field of materials, can solve problems such as high cost, long time consumption, and complex preparation process of thin-film thermocouples
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Embodiment 1
[0044] A tin dioxide-based thin-film thermocouple was prepared on a quartz substrate by atmospheric pressure chemical vapor deposition, and the specific preparation method was as follows:
[0045] 1) Clean the quartz substrate, the steps are as follows: put the quartz substrate in deionized water, and ultrasonically clean it for 20 minutes; take out the quartz substrate and place it in acetone, and ultrasonically clean it for 20 minutes; take out the quartz substrate and place it in 1mol / L dilute hydrochloric acid, and ultrasonically clean it 40min; take out the quartz substrate and place it in ethanol, and ultrasonically clean it for 20min;
[0046] 2) Clean the mask, the steps are as follows: put the mask in deionized water, and ultrasonically clean it for 20 minutes; take out the mask and place it in acetone, and ultrasonically clean it for 20 minutes; take out the mask and place it in ethanol, and ultrasonically clean it 20min;
[0047] 3) Place the quartz substrate on th...
Embodiment 2
[0056] A tin dioxide-based thin-film thermocouple was prepared on a quartz substrate by atmospheric pressure chemical vapor deposition, and the specific preparation method was as follows:
[0057] 1) Clean the quartz substrate, the steps are as follows: put the quartz substrate in deionized water, and ultrasonically clean it for 20 minutes; take out the quartz substrate and place it in acetone, and ultrasonically clean it for 20 minutes; take out the quartz substrate and place it in 1mol / L dilute hydrochloric acid, and ultrasonically clean it 40min; take out the quartz substrate and place it in ethanol, and ultrasonically clean it for 20min;
[0058] 2) Clean the mask, the steps are as follows: put the mask in deionized water, and ultrasonically clean it for 20 minutes; take out the mask and place it in acetone, and ultrasonically clean it for 20 minutes; take out the mask and place it in ethanol, and ultrasonically clean it 20min;
[0059] 3) Place the quartz substrate on th...
Embodiment 3
[0068] A tin dioxide-based thin-film thermocouple was prepared on a quartz substrate by atmospheric pressure chemical vapor deposition, and the specific preparation method was as follows:
[0069] 1) Clean the quartz substrate, the steps are as follows: put the quartz substrate in deionized water, and ultrasonically clean it for 20 minutes; take out the quartz substrate and place it in acetone, and ultrasonically clean it for 20 minutes; take out the quartz substrate and place it in 1mol / L dilute hydrochloric acid, and ultrasonically clean it 40min; take out the quartz substrate and place it in ethanol, and ultrasonically clean it for 20min;
[0070] 2) Clean the mask, the steps are as follows: put the mask in deionized water, and ultrasonically clean it for 20 minutes; take out the mask and place it in acetone, and ultrasonically clean it for 20 minutes; take out the mask and place it in ethanol, and ultrasonically clean it 20min;
[0071] 3) Place the quartz substrate on th...
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Abstract
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