Multifunctional Exposure Platform
A multi-functional, platform technology, applied in microlithography exposure equipment, photolithographic process exposure devices, optics, etc., can solve the problems of contact pollution between suction cups and workpieces, large sticking and positioning errors, and many movements, etc., to avoid contact. Pollution, the effect of improving positioning accuracy
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[0020] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0021] Such as figure 1 and figure 2 As shown, the present embodiment provides a multifunctional exposure platform 1, which includes a control unit (not shown) and a roller loading mechanism 11, a platform main body 12 and a roller unloading mechanism 13 arranged in sequence, and the platform main body 12 A guide push plate mechanism 14 is provided above, and the guide push plate mechanism 14 includes an L-shaped guide push plate 141 whose opening direction ...
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