A UV laser projection lens

Abstract

The invention discloses an ultraviolet laser projection lens, and belongs to the technical field of optical lenses. Ultraviolet laser light is excimer laser light which is 200 to 400nm in wavelength. The ultraviolet laser projection lens comprises an optical structure and a mechanical structure, wherein the optical structure comprises a first lens, a second lens and a third lens which are arranged in sequence along a transmission direction of incident rays; the first lens is a double convex cylindrical positive lens; the second lens is a concave-convex cylindrical negative lens; the third lens is a double convex cylindrical positive lens; and the mechanical structure comprises a fixed mount, a first adjusting assembly, a second adjusting assembly and a third adjusting assembly which are arranged in sequence along the transmission direction of the incident rays. The lens provided by the invention has a simple structure, is easy to mount and adjust, low in production cost and convenient to disassemble, assemble and maintain, and can be applied to a beam shaping system prepared from low-temperature polycrystalline silicon for panel display.

Description

technical field [0001] The invention belongs to the technical field of optical lenses and relates to an ultraviolet laser projection lens. Background technique [0002] As the core component of the active drive of the flat panel display, the thin film transistor's electrical performance determines the response speed, size, and the amount of information transmitted by the flat panel display. Compared with amorphous silicon thin film transistors, polysilicon thin film transistors have higher electron mobility, so flat panel displays made of them have superior performance. [0003] Excimer laser annealing technology for manufacturing polysilicon thin films is an advanced technology suitable for industrial production. The typical wavelength of the excimer laser is in the ultraviolet band, the thermal effect is not obvious, and its pulse width is narrow. The process of melting and recrystallization of amorphous silicon is very short, and the thermal damage to the substrate is sm...

AI Technical Summary

Problems solved by technology

[0005] As mentioned above, the ultraviolet laser projection lens is an important working part of the beam shaping system of excimer laser annealing equipment. At present, it can be applied to excimer laser annealing equipment to achieve high aspect ratio, energy density and evenly distributed spots The projected ultraviolet laser projection lens has not been reported, therefore, there is an urgent need to design an ultraviolet laser projection lens that can meet the requirements of relevant applications

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