Solar cell with color modulation and preparation method thereof
A solar cell and modulation technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of cumbersome preparation methods, difficult to reduce product manufacturing costs, and high prices, and achieve simple preparation methods, low manufacturing costs, and reasonable structure. Effect
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Embodiment 1
[0030] The concrete steps of preparation are:
[0031] Step 1, using the nanosphere template method to make an ordered mask on the surface of the silicon substrate; wherein, the silicon substrate is a single crystal silicon substrate, and the process of using the nanosphere template method to make an ordered mask is to make a single layer dense After the row of polystyrene colloidal nanospheres with a diameter of 500nm is transferred to the surface of the silicon substrate, the diameter of the nanospheres is reduced to 90-95nm, and then, using the colloidal sphere template as a mask, the silicon substrate is deposited by electron beam evaporation equipment. A gold film with a thickness of 20 nm was evaporated on the surface of the bottom to obtain a silicon substrate covered with an ordered gold mask. Then use a wet process to etch an ordered nanowire array on the silicon substrate covered with an ordered gold mask; wherein, the process of using a wet process to etch an ordere...
Embodiment 2
[0034] The concrete steps of preparation are:
[0035] Step 1, using the nanosphere template method to make an ordered mask on the surface of the silicon substrate; wherein, the silicon substrate is a single crystal silicon substrate, and the process of using the nanosphere template method to make an ordered mask is to make a single layer dense After the row of polystyrene colloidal nanospheres with a diameter of 750nm is transferred to the surface of the silicon substrate, the diameter of the nanospheres is reduced to 100-108nm, and then, using the colloidal ball template as a mask, the silicon substrate is deposited by electron beam evaporation equipment. A gold film with a thickness of 23nm was evaporated on the surface of the bottom to obtain a silicon substrate covered with an ordered gold mask. Then use a wet process to etch an ordered nanowire array on the silicon substrate covered with an ordered gold mask; wherein, the process of using a wet process to etch an ordered...
Embodiment 3
[0038] The concrete steps of preparation are:
[0039] Step 1, using the nanosphere template method to make an ordered mask on the surface of the silicon substrate; wherein, the silicon substrate is a single crystal silicon substrate, and the process of using the nanosphere template method to make an ordered mask is to make a single layer dense After the row of polystyrene colloidal nanospheres with a diameter of 1000nm is transferred to the surface of the silicon substrate, the diameter of the nanospheres is reduced to 110-115nm, and then, using the colloidal ball template as a mask, the silicon substrate is deposited by electron beam evaporation equipment A gold film with a thickness of 25 nm was evaporated on the surface of the bottom to obtain a silicon substrate covered with an ordered gold mask. Then use a wet process to etch an ordered nanowire array on the silicon substrate covered with an ordered gold mask; wherein, the process of using a wet process to etch an ordere...
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