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Optical device, exposure device with optical device, and article manufacturing method

A technology of optical equipment and optical components, which can be applied in the direction of photolithography process exposure device, optomechanical equipment, microlithography exposure equipment, etc., and can solve the problems of increasing the size of the cooling unit and increasing the cost.

Active Publication Date: 2020-11-03
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This results in increased size and cost of the cooling unit

Method used

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  • Optical device, exposure device with optical device, and article manufacturing method
  • Optical device, exposure device with optical device, and article manufacturing method
  • Optical device, exposure device with optical device, and article manufacturing method

Examples

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no. 1 example

[0016] figure 1 is a schematic diagram illustrating the configuration of an exposure apparatus to which the optical apparatus according to the first embodiment of the present invention is applied. The exposure apparatus 50 includes an illumination optical system IL, a projection optical system PO, a mask stage MS that holds a mask 55 movably, a substrate stage WS that holds a substrate 56 movably, and a controller 51 . In drawings to be described below, a Z axis is defined in an up-down direction (vertical direction), and an X axis and a Y axis perpendicular to each other are defined in a plane perpendicular to the Z axis. The illumination optical system IL includes a light source and a slit (both of which are not shown). The illumination optical system IL shapes the light emitted from the light source into, for example, an arc shape long in the XY direction, and irradiates the mask 55 with slit light. The mask stage MS and the substrate stage WS hold the mask 55 and the sub...

no. 2 example

[0033] Figure 4 is a schematic diagram illustrating the configuration of the cooling unit of the optical device according to the second embodiment. The same elements as those described in the first embodiment will be referred to by the same reference numerals, and descriptions thereof will not be repeated. The optical device 400 according to the present embodiment is different from the optical device according to the first embodiment in that the heat transfer member 124 a provided near the mirror fixing portion 102 passes through the cooling plate 125 .

[0034] According to the present embodiment, in addition to the Peltier element 301 and the heat sink 303, the heat of the coil 105a is transferred to the cooling plate 125 via the heat transfer member 124a, and collected. Therefore, in this embodiment, since the cooling load of the Peltier element 301 can be reduced more than in the first embodiment, a small-sized Peltier element 301 can be selected. Energy saving can also...

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Abstract

Disclosed are an optical device, an exposure device having the optical device, and an article manufacturing method. An optical device is provided for deforming an optical element using a plurality of actuator units. Each actuator unit includes a magnetic member attached to the optical element and a coil disposed to face the magnetic member in a non-contact manner. The optical device includes a reference plate configured to hold an optical element and has a coil disposed therein, and a cooling unit configured to cool the coil. The cooling capacity of the cooling unit varies according to the position where the coil is arranged.

Description

technical field [0001] The present invention relates to an optical device, an exposure apparatus having the optical device, and an article manufacturing method. Background technique [0002] There is known an optical device that can correct aberrations and the like caused by manufacturing errors, assembly errors, and the like of optical elements of an optical system. Optical equipment includes mirrors whose reflective surfaces can be changed in shape and used, for example, in equipment that projects light onto objects via projection optical systems, such as exposure devices or laser processing equipment. Aberrations and the like can be corrected by arranging optical devices on the optical path of the projection optical system and adjusting the shape of the mirror. Adjustment of the shape of the mirror is performed by a plurality of drive units provided on the back of the mirror, but it may be difficult to change the shape of the mirror to a desired shape due to heat emitted...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B26/08G03F7/20
CPCG02B26/0825G03F7/70266G02B6/0085G02B17/08
Inventor 西川原朋史
Owner CANON KK