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A speed-up method for image template optimization

A technology of image templates and templates, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems that affect the comparison efficiency of image templates and the uneven cutting marks, so as to shorten the operation time, reduce the matching time, and increase the success rate effect

Active Publication Date: 2019-01-22
ANHUI COREACH TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] There are the following defects: the image template of Han’s stealth cutting machine is to compare the rectangular image around the cutting line and frame the electrode, and compare the pattern according to the gray scale of the electrode in the image and the image outside the electrode
When comparing the image templates on the second side, the cutting marks are different, which seriously affects the efficiency of image template comparison

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] The technical solutions in the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention. Apparently, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0021] The embodiment of the present invention provides that the present invention provides an image template optimization speed-up method, an image template optimization speed-up method, which includes the following steps:

[0022] Select the stealth cutting machine and establish two kinds of chip parameter files, namely parameter file A and parameter file B. The difference between the two parameter files is that the second image template is different;

[0023] Among them, the parameter file A is a...

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Abstract

The present invention provides an image template optimization speed-up method, which comprises the following steps: select a Han's invisible cutting machine, and establish two kinds of chip parameter files, the difference between the two kinds of parameter files is that the second image template is different; the parameter file A is 4 Electrode 2 cutting line template, build the second image template according to the original template creation method; parameter file B is 2 electrodes 1 cutting line template, build the second side image template according to the new template establishment method; After finishing the first side of the chip, the table rotates to the second side, and adopts the 2-electrode 1-cut template method to quickly and accurately locate the image of the second side, effectively shortening the scribing time. The present invention adopts the laser cutting machine table 2 electrodes 1 cutting line template method, which reduces the template matching time and increases the matching success rate.

Description

technical field [0001] The invention relates to the technical field of LED chips, in particular to an image template optimization speed-up method. Background technique [0002] The manufacturing process of LED chips: epitaxial wafer→cleaning→plating transparent electrode layer→transparent electrode pattern lithographycorrosion→remove glue→platform pattern lithographydry etching→glue removal→annealing→SiO2 deposition→window pattern lithography → SiO2 corrosion → glue removal → N pole pattern photolithography → pre-cleaning → coating → stripping → annealing → P pole pattern photolithographycoating → stripping → grinding → cutting → chip → finished product test → sorting → appearance test → marking into library. [0003] The production process of the epitaxial wafer is very complicated. After the epitaxial wafer is displayed, the next step is to make electrodes (P pole, N pole) on the LED epitaxial wafer, and then start to cut the LED epitaxial wafer with a laser machine ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/00H01L33/20
CPCH01L33/005H01L33/20
Inventor 崔杰彭友陈龙丁磊
Owner ANHUI COREACH TECH