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Mirrors for lithography equipment and lithography equipment

A technology of lithography equipment and mirrors, applied in microlithography exposure equipment, optomechanical equipment, optics, etc., can solve problems such as optical aberration and achieve the effect of compact structure

Active Publication Date: 2019-09-10
CARL ZEISS SMT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, a mirror that is too thin and mechanically unstable can cause optical aberrations

Method used

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  • Mirrors for lithography equipment and lithography equipment
  • Mirrors for lithography equipment and lithography equipment
  • Mirrors for lithography equipment and lithography equipment

Examples

Experimental program
Comparison scheme
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Embodiment Construction

[0050] Unless otherwise indicated, identical reference numbers in the figures refer to identical or functionally identical elements. It should also be noted that the illustrations in the figures are not necessarily to scale.

[0051] figure 1 A schematic diagram of an EUV lithographic apparatus 100 comprising a beam shaping system 102 , an illumination system 104 and a projection system 106 is shown. The beam shaping system 102, the illumination system 104 and the projection system 106 are each provided in a vacuum enclosure, which is evacuated by means of an evacuation device, which is not shown in more detail. The vacuum enclosure is surrounded by a mechanical chamber (not shown in any other detail) in which drive means are provided for mechanically moving or adjusting the optical elements. Electrical controls etc. may also be provided in this mechanical room.

[0052] The beam shaping system 102 has an EUV light source 108 , a collimator 110 and a monochromator 112 . A ...

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PUM

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Abstract

Disclosed herein is a mirror (204) of a lithography system (100) that includes a mirror body (224) having a surface (226). The surface includes an optically active area (220) and an optically inactive area (222), the optically inactive area (222) being located at least partially within the optically active area (220). The mirror (204) also has means (218) for reducing the aberrations of the mirror (204), said means being arranged in the optically inactive region (222). To reduce aberrations, the device (218) has mechanical stabilization means (232).

Description

[0001] Cross References to Related Applications [0002] The content of priority application DE 10 2014 224 822 is hereby incorporated by reference in its entirety. technical field [0003] The invention relates to a reflection mirror of a lithography equipment and a lithography equipment. Background technique [0004] For example, lithographic equipment is used in the production of integrated circuits for imaging a mask pattern in a mask onto a substrate, such as a silicon wafer. Here, the mask pattern is imaged onto the substrate using a projection optics unit. Such a projection optics unit consists of a plurality of mirrors. As far as its design is concerned, there are conflicting requirements for mirrors regarding their ideal design for optical reasons and their ideal design for kinetic reasons. The projection optics unit specifies a position at which each mirror needs to be disposed. If there is little space available at a certain point in the projection optics unit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70266G03F7/70825G03F7/70891G03F7/709G02B5/0891G02B7/192G02B27/646
Inventor M.施瓦布R.芬肯B.戈珀特
Owner CARL ZEISS SMT GMBH