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Manufacturing process of silicon wafer circuit board of LED lamp

A manufacturing process, LED lamp technology, applied in the direction of circuit, electrical components, semiconductor/solid-state device manufacturing, etc., can solve the problems of circuit board surface depressions and holes, reduce production efficiency, increase production costs, etc., to improve curvature and flatness The effect of improving production efficiency and reducing production cost

Inactive Publication Date: 2017-08-18
ANHUI YILUMING PHOTOELECTRIC TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] With the improvement of living standards, people have relatively high requirements for daily lighting. LED lights are also widely used for lighting. Therefore, a large amount of processing and manufacturing of silicon circuit boards for LED lights is required. In the production of circuit boards in the past, due to the unreasonable production methods used, the surface of the circuit board is easy to trigger chemical reactions during production, resulting in surface depressions and holes on the surface of the circuit board, which affects the wiring and wiring of the entire circuit board. Therefore, the scrap rate of the circuit board is greatly improved, the production efficiency is reduced, and the production cost is also increased.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] A manufacturing process of a silicon wafer circuit board for an LED lamp, the manufacturing process steps of the silicon wafer circuit board are:

[0020] (1) Fix the slice, fix the pre-prepared monocrystalline silicon rods on the processing table, then cut the monocrystalline silicon into monocrystalline silicon wafers with uniform thickness, and continuously pour distilled water on the monocrystalline silicon wafers at the same time;

[0021] (2) Thermal annealing treatment. The single crystal silicon wafer after the previous step of slicing is heated at a high temperature through a thermal oxidation furnace and annealed until it is heated to 400°C, and then the surface of the single crystal silicon wafer in the thermal oxidation furnace is Inflate with oxygen and last for 15 minutes;

[0022] (3) chamfering treatment, the edge of the monocrystalline silicon wafer after the annealing treatment in step 2 is carried out through a fine grinding wheel for grinding and fin...

Embodiment 2

[0030] A manufacturing process of a silicon wafer circuit board for an LED lamp, the manufacturing process steps of the silicon wafer circuit board are:

[0031] (1) Fix the slice, fix the pre-prepared monocrystalline silicon rods on the processing table, then cut the monocrystalline silicon into monocrystalline silicon wafers with uniform thickness, and continuously pour distilled water on the monocrystalline silicon wafers at the same time;

[0032] (2) Thermal annealing treatment, the single crystal silicon wafer after the previous step of slicing is heated at a high temperature through a thermal oxidation furnace and annealed until it is heated to 440 ° C, and then the surface of the single crystal silicon wafer in the thermal oxidation furnace is Fill with oxygen and last for 11 minutes;

[0033] (3) chamfering treatment, the edge of the monocrystalline silicon wafer after the annealing treatment in step 2 is carried out through a fine grinding wheel for grinding and fini...

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Abstract

The purpose of the present invention is to provide a manufacturing process of a silicon wafer circuit board for LED lamps. The manufacturing process steps of its silicon wafer circuit board are: (1) fixing the slice, fixing the single crystal silicon rod prepared in advance on the processing table, Then the single crystal silicon is cut into single crystal silicon wafers with uniform thickness, (2) thermal annealing treatment, the single crystal silicon wafer after the previous step of slicing is heated at a high temperature through a thermal oxidation furnace and annealed, (3) chamfering Finishing treatment, the edge of the monocrystalline silicon wafer after the step 2 annealing treatment is carried out through the fine grinding wheel for grinding and finishing treatment, (4) grinding and cleaning treatment of the silicon wafer circuit board, preventing the silicon atoms on the surface of the circuit board from chemical reaction, preventing The formation of depressions and holes on the surface of the circuit board and the processing of the corners of the circuit board can greatly improve the orderliness of the corners of the circuit board, improve the curvature and flatness of the silicon surface, and improve the quality of the circuit board.

Description

technical field [0001] The invention relates to the field of processing technology of LED lamps, in particular to the improvement of the processing of silicon circuit boards of LED lamps, and in particular to a manufacturing process of silicon circuit boards of LED lamps. Background technique [0002] With the improvement of living standards, people have relatively high requirements for daily lighting. LED lights are also widely used for lighting. Therefore, a large amount of processing and manufacturing of silicon circuit boards for LED lights is required. In the production of circuit boards in the past, due to the unreasonable production methods used, the surface of the circuit board is easy to trigger chemical reactions during production, resulting in surface depressions and holes on the surface of the circuit board, which affects the wiring and wiring of the entire circuit board. Therefore, the scrap rate of the circuit board is greatly improved, the production efficienc...

Claims

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Application Information

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IPC IPC(8): H01L33/00H01L33/48H01L21/02
CPCH01L33/005H01L21/02H01L21/02002H01L33/48H01L2933/0008
Inventor 尤业明马光辉杨先勇刘圣豪解曙光彭昌余余晓梅马杰
Owner ANHUI YILUMING PHOTOELECTRIC TECH CO LTD