Simple flip high-voltage LED chip preparation method
A LED chip, high-voltage technology, applied in the direction of electrical components, electric solid devices, circuits, etc., can solve the problem of low light efficiency of chips, achieve high light efficiency, simplify the number of times of die bonding and bonding, and increase the current density.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment approach 1
[0034] This embodiment provides a method for preparing a simple flip-chip high-voltage LED chip, which mainly includes the following steps:
[0035] S1: Provide a light-transmitting substrate 1001 having n chip unit areas A1, A2...An, one flip-chip high voltage LED chip A consists of m chip unit areas A1, A2...Am The end and end are connected in series, where n≥2, 2≤m≤n.
[0036] In this embodiment, for the convenience of illustration and description, m is set to be equal to 3, that is, a flip-chip high-voltage LED chip A is formed by connecting three chip unit areas A1, A2 and A3 in series end to end.
[0037] The above-mentioned light-transmitting substrate 1001 can be selected from sapphire Al 2 O 3 Or gallium nitride GaN, etc.
[0038] S2: growing an epitaxial layer on the light-transmitting substrate 1001. like figure 1 and2 , the epitaxial layers here are buffer layer Buffer1018, N-type semiconductor layer N-GaN1019, light-emitting layer MQW1020 and P-type semicondu...
Embodiment approach 2
[0061] This embodiment is a further improvement of Embodiment 1, and the main improvement is: in order to weaken the problem of low light extraction efficiency caused by the total reflection angle of the light-transmitting substrate 1001, in this embodiment, each flip-chip high-voltage LED chip A is manufactured Compared with Embodiment 1, the method of forming a chip has been improved. In this embodiment, after grinding and polishing the transparent substrate 1001 (the grinding thickness can also be in the range of 50-500um), the transparent substrate 1001 after grinding and polishing is ground and polished. The surface of the optical substrate 1001 is roughened first, and then the light-transmitting substrate 1001 after the surface roughening is subjected to laser scribing, so as to divide each flip-chip high-voltage LED chip A into flip-chip high-voltage LED chips with roughened light-emitting surfaces. HV Flip Chip LEDs. The surface of the roughened light-transmitting subs...
Embodiment approach 3
[0064] This embodiment is a further improvement of Embodiment 1. The main improvement is that in this embodiment, the method of making each flip-chip high-voltage LED chip A into a chip has been improved compared with Embodiment 1. After the substrate 1001 is ground and polished, the light-transmitting substrate 1001 after grinding and polishing is removed by laser peeling, and then each flip-chip high-voltage LED chip A is divided into thin-film flip-chip high-voltage LED chips A by laser scribing. HV FlipChip LEDs. In this way, the prepared flip-chip high-voltage LED chip can completely remove the light-transmitting substrate 1001, and its bottom surface forms a fast heat conduction channel through the metal electrode and the bracket, and the heat source of the light-emitting layer on the top surface directly contacts the encapsulation colloid, so that the heat conduction of the chip The channel is the shortest.
[0065]Except for this, this embodiment is exactly the same a...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


