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Detecting system, detecting method and evaporation plating equipment of evaporation source

A detection system and detection method technology, applied in vacuum evaporation coating, sputtering coating, ion implantation coating and other directions, can solve the problems of reduced evaporation material, uneven film thickness, different evaporation materials, etc. The effect of uniformity

Active Publication Date: 2017-11-21
合肥欣奕华智能机器股份有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the above vapor deposition process has the following problems: in the vapor deposition process, each nozzle is easy to adhere to the vapor deposition material, and in the process of vapor deposition for a long time, the vapor deposition material attached to the nozzle will become more and more, resulting in The evaporation material ejected from the nozzles is reduced, and because the quality of the evaporation materials attached to each nozzle is different, the amount of evaporation materials ejected from different nozzles is also different, resulting in different thicknesses of the films deposited on the substrate. uniform

Method used

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  • Detecting system, detecting method and evaporation plating equipment of evaporation source
  • Detecting system, detecting method and evaporation plating equipment of evaporation source
  • Detecting system, detecting method and evaporation plating equipment of evaporation source

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Embodiment 1

[0040] Such as Figure 1 ~ Figure 3 As shown, this embodiment provides an evaporation source detection system for detecting the above-mentioned evaporation source 14. The evaporation source detection system includes: a mass sensor 11 and a nozzle clogging degree analysis unit; wherein, the mass sensor 11 is installed on the nozzle 6, a nozzle corresponds to at least one quality sensor 11, and the quality sensor 11 is used to detect the quality of the vapor deposition material ejected from the nozzle corresponding to the quality sensor and attached to the quality sensor before evaporation; the degree of nozzle clogging The analyzing unit is connected with the quality sensor 11 , and the nozzle clogging degree analyzing unit is used to analyze the clogging degree of the nozzle corresponding to the quality sensor 11 according to the quality of the vapor deposition material detected by the quality sensor 11 . Specifically, since the mass of the vapor deposition material attached t...

Embodiment 2

[0055] This embodiment provides an evaporation source detection method, which is applicable to the evaporation source detection system in Embodiment 1, such as Figure 1~3 As shown, the evaporation source detection method includes: using the quality sensor 11 to detect the quality of the evaporation material ejected from the nozzle corresponding to the quality sensor and attached to the quality sensor before evaporation; using the nozzle clogging degree analysis unit According to the detected quality of the evaporated material, the clogging degree of the nozzle 6 corresponding to the quality sensor is analyzed.

[0056] Since the quality of the vapor deposition material attached to the mass sensor 11 is inversely proportional to the clogging degree of the nozzle 6 corresponding to the mass sensor, it can be judged by analyzing the mass of the vapor deposition material attached to the mass sensor 11 that the mass sensor corresponds to The degree of clogging of the nozzles 6, so...

Embodiment 3

[0076] This embodiment provides an evaporation device, which includes a vacuum chamber, an evaporation source arranged inside the vacuum chamber, and an evaporation source detection system as described in Embodiment 1. The evaporation source detection system uses It is used to detect the evaporation source, so as to perform corresponding maintenance, replacement, regulation and other operations on the evaporation source or the components contained in the vacuum chamber according to the detection results, so as to achieve the purpose of optimizing the evaporation process.

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Abstract

The invention provides a detecting system, detecting method and evaporation plating equipment of an evaporation source, and relates to the technical field of display. The detecting system and detecting method of the evaporation source is used for improving thickness uniformity of an evaporation-plated coating layer evaporation-plated on a base plate. The detecting system of the evaporation source comprises a quality sensor arranged above a spray nozzle of the evaporation source and a spray nozzle plugging degree analyzing unit connected with the quality sensor, wherein the quality sensor is used for detecting quality of evaporation-plating materials sprayed from the spray nozzle corresponding to the quality sensor and attached to the quality sensor before evaporation plating, and according to the quality of the evaporation-plating materials obtained by detecting, the spray nozzle plugging degree analyzing unit analyzes corresponding plugging degrees of the quality sensor. The evaporation plating equipment is used for evaporation plating the evaporation-plating materials on the base plate.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an evaporation source detection system, a detection method, and evaporation equipment. Background technique [0002] OLED (Organic Light-Emitting Diode, Organic Light-Emitting Diode) display device is a mainstream display device with low power consumption, fast response speed, wide working range, easy realization of flexible display, outstanding light-to-dark ratio, and high-quality colors, etc. Many advantages. [0003] An OLED display device generally includes a color-resist layer, which includes three color-resistors R (red), G (green) and B (blue), and an evaporation process is generally used to form RGB color-resistors. The evaporation process is as follows: the evaporation source is placed in the vacuum chamber of the evaporation equipment, and the substrate is placed above the evaporation source. The evaporation source includes a crucible, a heater is arranged outside th...

Claims

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Application Information

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IPC IPC(8): C23C14/24C23C14/54
CPCC23C14/24C23C14/545
Inventor 李浩永金甲锡金薰
Owner 合肥欣奕华智能机器股份有限公司