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Preparation method and application of porous hollow-structure gallium sesquioxide photocatalyst

A technology of digallium trioxide and hollow structure, which is applied in the direction of catalyst activation/preparation, metal/metal oxide/metal hydroxide catalyst, physical/chemical process catalyst, etc., with good application prospects, simple preparation method, good light The effect of catalytic performance

Active Publication Date: 2017-12-08
ZHOUKOU NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, regarding the porous hollow structure Ga 2 o 3 There are few reports on photocatalytic degradation of antibiotics

Method used

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  • Preparation method and application of porous hollow-structure gallium sesquioxide photocatalyst
  • Preparation method and application of porous hollow-structure gallium sesquioxide photocatalyst
  • Preparation method and application of porous hollow-structure gallium sesquioxide photocatalyst

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preparation example Construction

[0026] The preparation method of gallium trioxide photocatalyst with porous hollow structure, the specific steps are as follows:

[0027] (1) Weigh gallium oxide and sodium carbonate, grind and mix them evenly, bake in a muffle furnace at 850-900°C for 12-15h, and obtain NaGaO after natural cooling 2 Precursor; wherein the molar ratio of gallium oxide and sodium carbonate is 1:1;

[0028] (2) NaGaO prepared in step (1) 2 Precursor mixed with ultrapure water, NaGaO 2 The ratio of precursor to ultrapure water is 2mmol:30mL, ultrasonically oscillate, and then add hydrochloric acid solution drop by drop under stirring, so that the pH value of the resulting suspension is controlled within the range of 2.8-9.0, and continue stirring for 10 minutes seal;

[0029] (3) Place the suspension prepared in step (2) in an oven for reaction. After the reaction, cool down to room temperature naturally, and a white precipitate appears in the solution;

[0030] (4) Wash, centrifuge and dry t...

Embodiment 1

[0037] The preparation method of porous hollow structure gallium trioxide photocatalyst, it comprises the following steps:

[0038] (1) Weigh gallium oxide and sodium carbonate according to the molar ratio of gallium oxide and sodium carbonate 1:1, grind and mix them evenly, bake them in a muffle furnace at 850°C for 12 hours, and obtain NaGaO after natural cooling 2 Precursor;

[0039] (2) Press NaGaO 2 Prepare NaGaO with the ratio of ultrapure water 2mmol:30mL 2 and ultrapure water, the NaGaO 2 Mix it with ultrapure water in a 100mL glass Erlenmeyer flask, ultrasonically oscillate for 2min, then add 5mol / L hydrochloric acid solution dropwise under stirring to make the pH of the resulting suspension = 2.8, continue stirring for 10min and then seal the glass cone shaped bottle mouth;

[0040] (3) Place the sealed glass Erlenmeyer flask in step (2) in an oven at 80°C for a reaction time of 12 hours. After the reaction, cool down to room temperature naturally, and a white pr...

Embodiment 2

[0044] The preparation method of porous hollow structure gallium trioxide photocatalyst, it comprises the following steps:

[0045] (1) Weigh gallium oxide and sodium carbonate according to the molar ratio of gallium oxide and sodium carbonate 1:1, grind and mix them evenly, bake them in a muffle furnace at 850°C for 12 hours, and obtain NaGaO after natural cooling 2 Precursor;

[0046] (2) Press NaGaO 2 Prepare NaGaO with the ratio of ultrapure water 2mmol:30mL 2 and ultrapure water, the NaGaO 2 Mix it with ultrapure water in a 100mL glass Erlenmeyer flask, ultrasonically oscillate for 2min, then add 5mol / L hydrochloric acid solution drop by drop under stirring to make the pH of the resulting suspension = 5.0, continue to stir for 10min and then seal the glass cone shaped bottle mouth;

[0047] (3) Place the sealed glass Erlenmeyer flask in step (2) in an oven at 80°C for a reaction time of 12 hours. After the reaction, cool down to room temperature naturally, and a white...

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Abstract

The invention discloses a preparation method and application of a porous hollow-structure gallium sesquioxide photocatalyst. The preparation method particularly comprises the following steps: roasting gallium oxide and sodium carbonate in a muffle furnace, and naturally cooling, so as to obtain a NaGaO2 precursor; mixing the prepared NaGaO2 precursor with ultrapure water, dropwise adding a hydrochloric acid solution, continuing to stir for 10 minutes, and carrying out sealing; adding prepared turbid liquid into a drying oven to react, and naturally cooling to the room temperature so as to generate white precipitates; and washing, centrifuging and drying the white precipitates, so as to obtain GaOOH precursors with different morphologic structures; and putting the GaOOH precursors into the muffle furnace, and roasting, so as to obtain the porous hollow-structure Ga2O3. The preparation method of the porous hollow-structure gallium sesquioxide photocatalyst is simple and low in energy consumption; the prepared porous hollow-structure gallium sesquioxide photocatalyst is high in impurity.

Description

technical field [0001] The invention belongs to the technical field of antibiotic wastewater treatment materials, and in particular relates to a preparation method and application of a porous hollow structure gallium trioxide photocatalyst for treating antibiotic wastewater. Background technique [0002] The widespread use of antibiotics leads to a large number of antibiotics in water bodies, which not only affects the reduction of the number and population of microorganisms in water bodies, but also destroys the ability of water bodies to purify pollutants, and some antibiotics also have carcinogenic and teratogenic effects. Affect the ecological balance of water bodies, and even human life and health. At present, although my country's domestic sewage treatment technology has become mature, the technology for treating trace amounts of refractory antibiotic wastewater in water is very lacking. Antibiotic wastewater is highly toxic, has poor biodegradability, and is difficul...

Claims

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Application Information

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IPC IPC(8): B01J23/08B01J35/10B01J37/08B01J37/03C02F1/30C02F101/30
CPCC02F1/30B01J23/08B01J37/031B01J37/038B01J37/08B01J37/082C02F2101/305C02F2305/10B01J35/39B01J35/60
Inventor 刘进钟倩王振领李俐俐
Owner ZHOUKOU NORMAL UNIV
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