Preparation method and preparation device of organic thin-film solar cell

Abstract

The invention provides a preparation method and a preparation device of an organic thin-film solar cell. The preparation method comprises the following steps: providing a substrate, and forming a first electrode on the surface of the substrate; providing an evaporator source, wherein the evaporator source comprises a carbon nano tube film structure and a light active layer source material, the carbon nano tube film structure is a carrier, the light active layer source material is arranged on the surface of the carbon nano tube film structure and is supported through the carbon nano tube film structure, the light active layer source material is a material of a light active layer or a precursor for forming the light active layer, and the precursor reacts in the evaporation process to generate the light active layer; enabling the evaporator source and the surface, provided with the first electrode, of the substrate to be opposite at an interval, and inputting an electromagnetic wave signal or an electric signal into the carbon nano tube film structure, so that the light active layer source material is evaporated on the first electrode to form the light active layer; and forming a second electrode on the light active layer.

Description

technical field [0001] The invention relates to a preparation method and a preparation device of an organic thin film solar cell. Background technique [0002] Organic thin-film solar cells have the advantages of low cost, light weight, bendability, and simple manufacturing process, and are one of the future research and development directions of solar cells. Existing organic thin-film solar cells mainly include dye-sensitized solar cells, heterojunction solar cells, and perovskite solar cells. The active layer of organic thin film solar cells can be produced by various methods such as evaporation, spin coating and spray coating, but the above methods all have the problem of poor uniformity when producing large-area thin films. Among the above methods, the evaporation method is a process of heating the evaporation source to vaporize the evaporation material and deposit a film on the surface of the substrate to be coated. In order to form a uniform film, it is necessary to ...

AI Technical Summary

Problems solved by technology

Especially when there are two or more evaporation sources, it is more difficult to control the evaporation rate of each evaporation source, and it is difficult to form a predetermined ratio of mixed evaporation material gas

The larger the size of the coating, the more difficult it is to ensure the uniformity of the film formation, and because it is difficult to control the diffusion direction of the gaseous evaporation material atoms, most of the evaporation materials cannot be attached to the surface of the substrate to be coated, resulting in a low evaporation rate and Problems such as slow evaporation speed

Images