Ion beam polishing equipment with long-term continuous working capability

Abstract

The invention discloses ion beam polishing equipment with the long-term continuous working capability. The ion beam polishing equipment comprises a discharge cavity, an anode board and grille boards. Two mounting blocks are arranged on the grille board on the outermost layer; a tungsten filament is arranged on each mounting block, wherein the free end of the tungsten filament stretches out to the outer side of the mounting block; a ceramic connecting block is arranged between every two adjacent grille boards; the two opposite sides of each ceramic connecting block are fixedly connected with the corresponding two grille boards respectively; through holes of the grille boards are distributed in the centers of the grille boards; the two mounting blocks are symmetrically distributed on the two sides of the center of the grille boards; each mounting block is connected to the corresponding tungsten filament, the free ends of the two tungsten filament are twisted with each other; and grooves are formed in the side faces, facing the center of the grille boards, of the mounting blocks, and the hole diameter of each groove is linearly increased from the open end to the interior. The ion beam polishing equipment with the long-term continuous working capability is used for solving the problem that an ion beam polisher in the prior art cannot keep long-time normal work, and the purposes of improving the normal working duration of the ion beam polisher and reducing the cleaning frequency are achieved.

Description

technical field [0001] The invention relates to the field of ion beam polishing, in particular to ion beam polishing equipment with long-term continuous working capability. Background technique [0002] The so-called ion beam polishing is to put inert gas, such as argon, nitrogen, etc. in a closed space, and use high-frequency electromagnetic oscillation or discharge to heat the cathode current to ionize it into positive ions, and then use 5,000 to 100,000 volts to The high voltage accelerates these positive ions, giving them a certain amount of energy. Use electron lens to focus, focus them into a thin beam, form a high energy density ion flow, under the control of the computer, bombard the surface of the workpiece that has been finely ground in the vacuum chamber, and sputter the workpiece material atom by atom from the surface . In this way, the surface of the workpiece can be precisely machined with a depth from 100 angstroms to about 10 microns. Most of the existing ...

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Problems solved by technology

[0003] The purpose of the present invention is to provide an ion beam polishing equipment with long-term continuous working capability, so as to solve the problem that the ion beam polishing machine cannot maintain normal operation for a long time in the prior art, so as to improve the normal working time of the ion beam polishing machine and reduce the cleaning frequency the goal of

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