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Metrology target design for tilted device designs

A target design and target technology, applied in the field of metrology, can solve problems such as large measurement errors

Active Publication Date: 2018-01-02
KLA CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Figure 1 demonstrates the presence of large and uncorrelated PPE for the two processes, resulting in large measurement errors

Method used

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  • Metrology target design for tilted device designs
  • Metrology target design for tilted device designs
  • Metrology target design for tilted device designs

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Embodiment Construction

[0041] In the following description, various aspects of the invention are described. For purposes of explanation, specific configurations and details are set forth in order to provide a thorough understanding of the present invention. However, it will also be apparent to those skilled in the art that the present invention may be practiced without the specific details presented herein. Furthermore, well-known features may have been omitted or simplified in order not to obscure the invention. With particular reference to the drawings, it is emphasized that the details shown are by way of example and for purposes of illustrative discussion of the invention only, and are presented for the purpose of providing what is believed to be the most useful and readily understood description of the principles and conceptual aspects of the invention. In this regard, without attempting to show structural details of the invention in greater detail than is necessary for a basic understanding o...

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Abstract

Metrology methods, modules and targets are provided, for measuring tilted device designs. The methods analyze and optimize target design with respect to the relation of the Zernike sensitivity of pattern placement errors (PPEs) between target candidates and device designs. Monte Carlo methods may be applied to enhance the robustness of the selected target candidates to variation in lens aberrationand / or in device designs. Moreover, considerations are provided for modifying target parameters judiciously with respect to the Zernike sensitivities to improve metrology measurement quality and reduce inaccuracies.

Description

[0001] Cross-references to related applications [0002] This application claims the benefit of US Provisional Patent Application No. 62 / 150,290, filed April 21, 2015, which is incorporated herein by reference in its entirety. technical field [0003] The present invention relates to the field of metrology, and more particularly, the present invention relates to metrology target design. Background technique [0004] In the field of semiconductor metrology, a metrology tool may include: an illumination system that illuminates a target; a collection system that captures relevant information provided by the interaction (or lack thereof) of the illumination system with a target, device, or feature; and a processing system that analyzes the collected information using one or more algorithms. Metrology tools can be used to measure structural and material properties (eg, material composition, dimensional properties of structures and films (eg, film thickness and / or critical dimen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01J9/00G03F7/00G03F7/20H01L21/66
CPCG03F7/70683G01J9/00G03F7/705H01L22/30G03F7/70591
Inventor 李明俊M·D·史密斯M·E·阿德尔E·阿米特D·坎戴尔
Owner KLA CORP