Antimony selenide thin film solar cell and method for preparing same
A technology of solar cells and antimony selenide, which is applied in circuits, electrical components, photovoltaic power generation, etc., can solve the problems of destroying the quality of heterojunctions, hindering the improvement of efficiency, and decreasing the stability of devices, so as to improve the stability of devices and improve Effect of stability, high dielectric constant
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Embodiment 1
[0037] Please refer to figure 2 , the antimony selenide thin film solar cell of the present embodiment is glass substrate, ITO layer, CdS layer, ZrO 2 layer, antimony selenide light-absorbing active layer, gold electrode. Its preparation method is as follows:
[0038] (1) A transparent conductive oxide layer is fabricated on the upper surface of the glass substrate, and an ITO layer is used in this embodiment. Then use the ultrasonic cleaning method to ultrasonically clean the glass substrate with the ITO layer at a heating temperature of 20-50°C according to the following steps, each step is 30 minutes: detergent + deionized water, acetone, isopropanol, ethanol, deionized ionized water. After cleaning, blow dry with nitrogen.
[0039] (2) Depositing a cadmium sulfide (CdS) film as an N-type layer by using a chemical water bath deposition method. The temperature of the water bath is 68.5°C, first put 220ml of deionized water into a 500ml beaker and stir to preheat to 68....
Embodiment 2
[0049] Please refer to Figure 5 , the antimony selenide thin film solar cell of the present embodiment is glass substrate, FTO layer, ZnO layer, SiO 2 layer, antimony selenide light-absorbing active layer, gold electrode. Its preparation method is as follows:
[0050] (1) Fabricate a transparent conductive oxide layer on the upper surface of the glass substrate, and this embodiment uses an FTO layer. Ultrasonic cleaning method is used to ultrasonically clean the glass substrate with FTO layer according to the following steps, each step is 30min, and the heating temperature is 20-50°C: detergent + deionized water, acetone, isopropanol, ethanol, deionized water. After cleaning, blow dry with nitrogen.
[0051] (2) Deposit a layer of ZnO buffer layer as an N-type layer on the transparent conductive film by spraying thermal decomposition method, the raw material is preferably zinc acetate, and the decomposition temperature is preferably 500 degrees Celsius.
[0052] (3) Using...
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