Alloy processing method

A processing method and alloy technology, which are applied in the field of sputtering targets, can solve the problem that the performance of the target blank needs to be improved, and achieve the effects of uniform heating and uniform structure.

Inactive Publication Date: 2018-02-06
KONFOONG MATERIALS INTERNATIONAL CO LTD
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  • Abstract
  • Description
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Problems solved by technology

[0004] However, the performance of the existing

Method used

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[0022] AlSc alloy has been gradually used in the manufacture of target blanks due to its superior properties such as good corrosion resistance, mechanical strength, toughness, heat resistance, plasticity and weldability. In the manufacturing process of target blanks, the current heat treatment method for AlSc alloy is mainly: placing the AlSc alloy in a heating furnace, and heat-treating the AlSc alloy through convection or radiation heat transfer.

[0023] However, in the process of placing the AlSc alloy in a heating furnace for heat treatment, it is difficult to ensure that the temperature in the heating furnace is stable, and it is difficult to ensure that the AlSc alloy is heated uniformly, resulting in the structure of the AlSc alloy in the transverse and longitudinal directions. The structure is inconsistent due to uneven heating, which makes it difficult for the formed target blank to meet the requirements of target sputtering.

[0024] In order to solve the above problems,...

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Abstract

The invention provides an alloy processing method. The alloy processing method comprises the following steps: an AlSc alloy material is provided; high-temperature sand is provided; and the AlSc alloymaterial is buried in the high-temperature and, and is heated at a preset temperature. The AlSc alloy material is buried in the high-temperature and, and is heated at the preset temperature. The high-temperature sand is used as an indirect heating medium, and is used for transferring heat to the AlSc alloy material, so that the AlSc alloy material can be uniformly heated, and the structure of theheated AlSc alloy material is uniform.

Description

technical field [0001] The invention relates to the technical field of sputtering targets, in particular to an alloy processing method. Background technique [0002] In the field of sputtering target manufacturing, the target assembly is composed of a target blank that meets the sputtering performance and a back plate that is combined with the target blank by welding. The production process of the target blank generally includes: melting, homogenization treatment, plastic deformation processing, heat treatment, mechanical processing and other steps. On the basis of strictly controlling the purity of the target, by selecting different plastic deformation processing and heat treatment conditions, adjusting the grain orientation and grain size of the target, and finally forming a target that meets the sputtering requirements. [0003] In particular, heat treatment is an indispensable process in target design and processing. The heat treatment is often closely combined with pla...

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Application Information

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IPC IPC(8): C22F1/04C22C21/00C23C14/34
CPCC22F1/04C22C21/00C23C14/3407
Inventor 姚力军潘杰相原俊夫王学泽陈勇军
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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