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Method for preparing tungsten silicide coating layer on surface of tungsten or tungsten alloy

A technology of tungsten alloy and tungsten silicide, which is applied in the field of high-temperature protective coatings, can solve the problems of further improvement and large difference in thermal expansion coefficient, achieve good high-temperature oxidation resistance, reduce thermal expansion coefficient mismatch, and good repeatability Effect

Active Publication Date: 2018-02-09
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the bonding method between the coating and the substrate prepared by a single plasma spraying technology is mainly mechanical occlusion, and there is an obvious interface. Due to the large difference in thermal expansion coefficient (W: 4.5×10 -6 ·K -1 , WSi 2 : 8.5×10 -6 ·K -1 ), so that the bonding performance between the coating and the substrate needs to be further improved

Method used

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  • Method for preparing tungsten silicide coating layer on surface of tungsten or tungsten alloy
  • Method for preparing tungsten silicide coating layer on surface of tungsten or tungsten alloy
  • Method for preparing tungsten silicide coating layer on surface of tungsten or tungsten alloy

Examples

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Embodiment 1

[0034] A tungsten silicide coating on a tungsten metal surface, the preparation of which comprises the steps of:

[0035] 1) Sandblasting the surface of the W substrate with a sandblasting pressure of 0.4 MPa, sonicating twice in absolute ethanol solution for 5 minutes each time, drying at 100°C for 2 hours, and set aside;

[0036] 2) Use silicon powder with a median particle size of about 30 μm and a purity greater than 98wt.% as the raw material for spraying, dry at 100°C for 3 hours, and set aside;

[0037] 3) Using a plasma spraying system (A-2000, Sulzer Metco AG, Switzerland), select the process parameters in Table 1, spray silicon powder onto the surface of the W substrate to form a silicon coating, the thickness of the silicon coating is about 110 μm, figure 1 The XRD results show that the silicon coating is a cubic phase;

[0038] Table 1 is the process parameters of plasma spraying Si coating:

[0039]

[0040] 4) Using argon-protected vacuum-atmosphere sinterin...

Embodiment 2

[0055] A tungsten silicide coating on a tungsten metal surface, the preparation of which comprises the steps of:

[0056] 1) Sandblasting the surface of the W substrate with a sandblasting pressure of 0.4 MPa, sonicating twice in absolute ethanol solution for 5 minutes each time, drying at 100°C for 2 hours, and set aside;

[0057] 2) Use silicon powder with a median particle size of about 30 μm and a purity greater than 98wt.% as the raw material for spraying, dry at 100°C for 3 hours, and set aside;

[0058] 3) Using plasma spraying technology and selecting the process parameters in Table 3, spray silicon powder onto the surface of the W substrate to form a silicon coating. The thickness of the silicon coating is about 110 μm. figure 1 The XRD results show that the silicon coating is a cubic phase;

[0059] 4) A vacuum-atmosphere sintering furnace protected by argon is used, and a diffusion reaction occurs between the silicon coating and the W substrate to form a tungsten s...

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Abstract

The invention relates to a method for preparing a tungsten silicide coating layer on the surface of tungsten or tungsten alloy. Silicon powder serves as a raw material, a silicon coating layer is prepared on the surface of the metal tungsten or a tungsten alloy matrix by adopting a plasma spraying technology, then, the silicon coating layer is placed into an inert atmosphere to be subjected to heat treatment for 1-10 hours at 1000-1500 DEG C, and accordingly, the tungsten silicide coating layer is formed on the surface of the matrix. The preparation method has the advantages of being simple inprocess, low in cost, high in efficiency, good in repeatability, suitable for scale production and the like and has wide application prospects.

Description

technical field [0001] The invention relates to a method for preparing a silicide coating, in particular to a method for preparing a tungsten silicide coating on the surface of tungsten or a tungsten alloy, and belongs to the technical field of high-temperature protective coatings. Background technique [0002] Tungsten (W) is the metal with the highest melting point, has good high-temperature strength, and is an important high-temperature structural material. However, tungsten and tungsten alloys are easily oxidized in a high-temperature aerobic environment, forming non-protective oxides (WO 3 ), losing its excellent high-temperature performance. In order to improve the high-temperature oxidation resistance of tungsten and tungsten alloys, a more feasible method is to prepare a high-temperature oxidation-resistant coating on the surface. [0003] Tungsten disilicide (WSi 2 ) is an important high-temperature oxidation-resistant coating material. Its anti-oxidation perfor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C4/134C23C4/18C23C4/10
CPCC23C4/10C23C4/134C23C4/18
Inventor 牛亚然翟翠红李红黄利平郑学斌孙晋良丁传贤
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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