Polyimide-based composite film and preparation method thereof
A polyimide-based, polyimide-based technology, applied in the field of polyimide-based composite film and its preparation, can solve the problems of low transmittance, affecting the stability of electronic components, and high thermal expansion coefficient
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Embodiment 1
[0050] A preparation method of a polyimide-based composite film, comprising the steps of:
[0051] ①. Take 4 parts by weight of nano-silica (particle size is 30nm), 1 part of dispersant (specifically ethyl acetate), 2 parts of binder (specifically hydroxypropyl methylcellulose), organic 80 parts of solvent (specifically N-methyl-2-pyrrolidone), stirred evenly to make a slurry;
[0052] ②. At room temperature, weigh pyromellitic dianhydride and p-phenylenediamine in a molar ratio of 1:1, the total weight is 90 parts, and add it to the slurry prepared in step 1), in a nitrogen atmosphere , carry out sufficient low-temperature polycondensation reaction at 30°C for 6 hours to obtain a reaction slurry;
[0053] ③. In a nitrogen atmosphere, evenly coat the reaction slurry on a clean and smooth glass substrate, control the coating thickness to 40 μm, and bake at 120°C for 20 minutes to form a film;
[0054] ④. In a nitrogen atmosphere, heat the film in step ③ from 150°C to 450°C at...
Embodiment 2
[0058] A preparation method of a polyimide-based composite film, comprising the steps of:
[0059] ①. Take 6 parts by weight of nano-silicon nitride (particle size is 40nm), 1.5 parts of dispersant (specifically, alkylphenol polyoxyethylene ether), 3 parts of binder (specifically, butadienyl triethyl Oxysilane), 120 parts of organic solvent (specifically N,N-dimethylformamide), stirred evenly to make a slurry;
[0060] ②. At room temperature, weigh pyromellitic dianhydride and m-phenylenediamine in a molar ratio of 1:1, the total weight is 135 parts, and add it to the slurry prepared in step 1), in a nitrogen atmosphere , fully carry out the low-temperature polycondensation reaction at 35°C for 3 hours, and obtain the reaction slurry;
[0061] ③. In a nitrogen atmosphere, evenly coat the reaction slurry on a clean and smooth glass substrate, control the coating thickness to 30 μm, and bake at 130°C for 10 minutes to form a film;
[0062] ④. In a nitrogen atmosphere, heat the...
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