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Optical module with tiltable optical surfaces

An optical module and optical surface technology, which is applied in the field of facet mirrors and optical imaging, can solve the problems of low rigidity of support components and inaccurate position definition, and achieve the effects of preventing torsion, simple design, and improving flexibility

Active Publication Date: 2018-03-20
CARL ZEISS SMT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The problem here is on the one hand the lower rigidity of the thin support elements
In addition, the position of the tilt lever in the de-energized state cannot be precisely defined, which can lead to overshoot effects when put into operation

Method used

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  • Optical module with tiltable optical surfaces
  • Optical module with tiltable optical surfaces
  • Optical module with tiltable optical surfaces

Examples

Experimental program
Comparison scheme
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Embodiment Construction

[0058] Refer to the following Figure 1 to Figure 6 A preferred embodiment of a projection exposure apparatus 101 according to the invention is described, which comprises a preferred embodiment of an optical module according to the invention. In order to simplify the following description, an xyz coordinate system is introduced in the drawings, where the z direction coincides with the gravitational direction. Of course, any different orientation of the xyz coordinate system can also be selected in other configurations.

[0059] figure 1 A schematic illustration, not to scale, of a projection exposure system 101 for producing semiconductor components in a microlithographic process is shown. The projection exposure apparatus 101 includes an illumination device 102 and a projection device 103 . The projection device 103 is designed to transfer the structure image of the mask 104.1 arranged in the mask unit 104 to the substrate 105.1 arranged in the substrate unit 105 during th...

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PUM

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Abstract

The present invention relates to an optical module, in particular a facet reflecting mirror, comprising a carrier unit for an optical surface and a support structure for supporting the carrier unit. The support structure comprises a base unit, a first support unit and a second support unit different from the first support unit. The first support unit defines a first movement plane and a first tiltaxis of the carrier unit, wherein the carrier unit is tiltable relative to the base unit about the first tilting axis. The second support unit is arranged defines a second movement plane and a secondtilt axis of the carrier unit, wherein the carrier unit is tiltable relative to the base unit about the second tilting axis. The first support unit and the second support unit are arranged kinematically parallel between the base unit and the carrier unit, the first support unit and the second support unit are respectively designed as a four-connecting-bar mechanism, which allows a translational movement of the carrier unit relative to the base unit in the respective movement plane. The first support unit and the second support unit respectively have at least one decoupling section, which permits the translational movement in the movement plane of the respective other support unit.

Description

technical field [0001] The invention relates to an optical module, in particular a facet mirror, having one or more tiltable optical surfaces. The invention also relates to an optical imaging device having such an optical module, a corresponding method of a carrier device for supporting an optical surface of such an optical module, and a corresponding optical imaging method. The present invention can be used in conjunction with any optical imaging method. The invention can be used particularly advantageously in the production or inspection of microelectronic circuits and the optical components used therefor, such as optical masks. Background technique [0002] Optical modules of the described type, in particular facet mirrors (“Facettenspiegel”: also called “segmented mirrors”) in semiconductor lithography at operating wavelengths in the ultraviolet range (for example in the range of 193 nm), but can also In the so-called extreme ultraviolet range (EUV) with an operating w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/09G03F7/20G02B7/18
CPCG02B5/09G02B7/1821G03F7/70175G02B7/1822G03F7/70075G03F7/70116G02B7/1827G02B26/0816G03F7/2063G03F7/70141G03F7/70258
Inventor U.韦伯M.纳夫齐
Owner CARL ZEISS SMT GMBH