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Selective surface patterning via nanoimrinting

A patterning and patterning technology, applied in biochemical equipment and methods, microbial determination/inspection, photoengraving process of patterned surface, etc., can solve problems such as waste

Active Publication Date: 2018-04-17
ILLUMINA INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In this case, some of the polymer or hydrogel is wasted in the polishing step of the fabrication process

Method used

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  • Selective surface patterning via nanoimrinting
  • Selective surface patterning via nanoimrinting
  • Selective surface patterning via nanoimrinting

Examples

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Embodiment Construction

[0012] The standard nanoimprint lithography process for preparing a patterned flow cell can involve several steps, including: spin coating a layer of a polymer precursor formulation (formulation) onto a primed circle On a wafer (wafer); soft-baked the polymer precursor layer to drive out the solvent; embossing the wafer and exposing it to UV to initiate curing of the polymer precursor; and, hard-baking The wafer is described to complete the curing process and lock the topography of the imprint. In this standard scenario, a single polymer precursor formulation is used, which results in an imprinted film with uniform chemical functional groups throughout its volume. The surfaces of the pores and interstitial regions will have the same chemical functional groups at their surfaces.

[0013] In some embodiments of the present application, two different polymer precursor formulations each having a tailored chemical functional group can be used in succession to construct a two-layer po...

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Abstract

Substrates comprising dual functional polymer layered surfaces and the preparation thereof by using UV nano-imprinting processes are disclosed. The substrates can be used as flow cells, nanofluidic ormicrofluidic devices for biological molecules analysis.

Description

Technical field [0001] In general, this application relates to the field of nano-patterning processes and related substrates with micro- or nano-patterned surfaces. More specifically, this application relates to a substrate including a bifunctional polymer layered surface with a binary surface chemistry. A method of preparing these substrates by using a nanoimprint lithography process is also disclosed. Background technique [0002] Nanoimprint technology enables economical and effective manufacturing of nanostructures. The standard nano-embossing (embossing) lithography method uses a stamp (stamp) with a nanostructure to directly mechanically deform the resist material, followed by an etching process to remove the nanostructure from the stamp Transfer to the substrate. [0003] A flow cell is a device that allows fluid to flow through channels (channels) or wells (wells) in the substrate. Patterned flow chambers useful in nucleic acid analysis methods include discrete pores wi...

Claims

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Application Information

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IPC IPC(8): G03F7/00
CPCG03F7/0002G01N21/645B01L3/5085B01L2300/069B01L2300/0819B01L2300/0829B01L2300/0887B01L2300/161B01L2200/12B01L2200/16C12Q1/6874G03F7/161
Inventor A.A.布朗W.N.乔治A.里奇兹S.M.鲍恩
Owner ILLUMINA INC