A Beam Attitude Adjustment Method for Scanning Interference Field Exposure System

Abstract

The invention discloses a beam attitude adjustment method for a scanning interference field exposure system. The structure of the beam attitude adjustment method for a scanning interference field exposure system includes a beam macro adjustment module and a beam micro adjustment module, which are used for scanning interference fields The steps of the beam attitude adjustment method of the exposure system are as follows: the laser beam first enters the beam micro-adjustment module to stabilize the micro-motion attitude, the outgoing beam adjusted by the beam micro-adjustment module passes through the beam splitting grating, and the beam split by the beam splitting grating Then enter the beam macro adjustment module to adjust the macro attitude; the beam macro adjustment module can accurately position and adjust the laser beam pointing, and the beam micro adjustment module can correct the laser beam drift in real time, so as to effectively expose the scanning interference field The attitude of the laser beam is controlled and jitter suppressed to ensure the accuracy and stability of the exposure laser beam pointing, and to provide a strong guarantee for scanning interference exposure to obtain high-quality holographic grating grooves.

Description

technical field [0001] The invention relates to the field of spectrum technology, in particular to a macro-level and micro-level light beam attitude adjustment method in the optical path of manufacturing a holographic grating by scanning interference exposure. Background technique [0002] Scanning interference field exposure technology is a method of making holographic gratings, which uses a small-diameter laser beam as the exposure light source. In the production of traditional static holographic gratings, only the middle part of the laser beam participates in the exposure after beam expansion, and the requirements for the overall coincidence of the interference beams are relatively low. The beam as a whole participates in the exposure, and the beam pointing accuracy directly affects the quality of the grating mask produced. It is obviously difficult to manually adjust the accuracy to meet the requirements. Therefore, it is necessary to precisely adjust the laser beam poin...

AI Technical Summary

Problems solved by technology

In the production of traditional static holographic gratings, only the middle part of the laser beam participates in the exposure after beam expansion, and the requirements for the overall coincidence of the interference beams are relatively low. The beam as a whole participates in the exposure, and the beam pointing accuracy directly affects the quality of the grating mask produced. It is obviously difficult to manually adjust the accuracy to meet the requirements. Therefore, it is necessary to precisely adjust the laser beam pointing attitude during the exposure process.

At the same time, due to the drift characteristics of the laser beam itself, as well as the beam drift and jitter caused by factors such as table vibration, optical component vibration, and external environmental disturbances, the beam pointing accuracy decreases during the exposure process, which affects the uniformity of the mask produced. poor quality

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