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Combination of patterned metal wire and substrate

A technology of composition and compound, which is applied in the direction of metal pattern materials, removal of conductive materials by chemical/electrolytic methods, semiconductor devices, etc., can solve the problems of unstable etchant, reduce the opening ratio of display device pixel areas, etc., and achieve improved Effects of opening ratio, productivity improvement, and foundation thickness reduction

Active Publication Date: 2018-05-18
SAMSUNG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, such persulfate-based etchants tend to be unstable when stored at room temperature, and they are limited in terms of the maximum amount of substrates that can be processed by a predetermined amount of etchant solution
[0006] Furthermore, when trying to reduce the RC delay problem by increasing the thickness of the signal line, the copper wiring formed by conventional etchants may develop undesirably small (sharper) by increasing the size of the base of the wiring cross-section. Compensate the base cone angle, thereby undesirably reducing the opening ratio (opening ratio) of the pixel area of ​​the display device (opening ratio, aperture ratio)

Method used

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  • Combination of patterned metal wire and substrate
  • Combination of patterned metal wire and substrate
  • Combination of patterned metal wire and substrate

Examples

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Embodiment Construction

[0027] Hereinafter, an etchant composition, a metal wire formed using the etchant composition, and a method of manufacturing a display substrate using the etchant composition will be described in detail with reference to the accompanying drawings.

[0028] etchant composition

[0029] An etchant composition according to an exemplary embodiment includes phosphoric acid (H 3 PO 4 ), nitric acid (HNO 3 ), acetic acid (CH 3 COOH), copper ion compound (Cu-X), nitrate (Y-NO 3 ), acetate (Z-CH 3 CO 2 ), and the rest of the deionized water. The etchant composition may further include fluorometallic acid. Hereinafter, each component of the etchant composition will be described in further detail.

[0030] phosphoric acid

[0031] The phosphoric acid component of the etchant composition can react with copper to etch the copper-based conductive layer. For example, phosphoric acid can oxidize copper according to the following reaction:

[0032] 3Cu+2H 3 PO 4 → Cu 3 (PO 4...

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Abstract

A combination of patterned metal wire and a substrate having the metal wire formed thereon, the metal wire comprising: an oxide layer including indium and zinc; and a copper-based layer disposed on orunder the oxide layer including indium and zinc, wherein a zinc oxide amount of the oxide layer including indium and zinc is equal to or more than 10% by weight and less than about 35% by weight. A wet etching composition usable for etching a copper-based wiring layer includes between about 40% by weight to about 60% by weight of phosphoric acid, between about 1% by weight to about 10% by weightof nitric acid, between about 3% by weight to about 15% by weight of acetic acid, between about 0.01% by weight to about 0.1% by weight of a copper-ion compound, between about 1% by weight to about 10% by weight of a nitric salt, between about 1% by weight to about 10% by weight of an acetic salt, and a remainder of water.

Description

[0001] This application is a divisional application of an invention patent application with an application date of June 26, 2013, an application number of 201310260941.4, and an invention title of "a combination of a patterned metal wire and a substrate". technical field [0002] The present disclosure relates to a metal wiring (wiring) etchant composition, to a metal wiring formed using the etchant composition and to a method of manufacturing a display substrate. More specifically, the exemplary embodiments relate to an etchant composition for etching a metal wiring layer containing copper as a main component, to metal wiring formed by using the etchant composition, and to manufacturing a display substrate using the etchant composition. method. Background technique [0003] Typically, a flat or curved display (eg, a liquid crystal display or LCD) includes a display substrate having patterned wiring formed entirely thereon for interconnecting circuits such as thin film trans...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/12H01L29/45H01L29/49H01L29/786H05K1/09H05K3/06
CPCH01L29/458H01L29/4908H01L29/7869H01L27/1225H01L27/124C23F1/18C23F1/02H05K3/06C23F1/16H05K1/09H05K3/067
Inventor 朴弘植李旺宇金俸均郑钟铉林永祐金奎布徐源国申贤哲韩筵昊李骐范曹三永
Owner SAMSUNG DISPLAY CO LTD
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