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Heat energy utilization system and method in polysilicon production process

A production process, polysilicon technology, applied in the thermal energy utilization system and thermal energy utilization field, can solve the problems of high consumption, high cost, high operating cost, etc., and achieve the effect of avoiding waste, avoiding consumption, and improving heat utilization rate

Active Publication Date: 2019-08-16
XINTE ENERGY
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Problems solved by technology

[0009] It can be seen that in the regeneration process of the adsorption column, a large amount of high-temperature and high-pressure steam needs to be consumed, and the high-temperature and high-pressure steam usually needs to be purchased from a nearby power plant and transported to the user through a pipeline, which is expensive, and the adsorption column is continuous in the polysilicon production process. To run the equipment, it is counted in months or years, and the cost of operation is high

Method used

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  • Heat energy utilization system and method in polysilicon production process
  • Heat energy utilization system and method in polysilicon production process

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Effect test

Embodiment 1

[0032] Such as figure 1 As shown, this embodiment provides a thermal energy utilization system in the polysilicon production process, which includes a flash tank 2, a reduction furnace water pump 3, a cold water pump inlet regulating valve 11, a cold water pump 8, a cold water heat exchanger 10, and a hot water pump inlet Regulating valve 12 and hot water pump 9.

[0033]In this embodiment, it is necessary to input cooling water (which may be referred to as cooling water) to the furnace cylinder of reduction furnace 1 for cooling the furnace cylinder to ensure that the temperature of the equipment will not be too high and cause an accident. From the furnace cylinder of reduction furnace 1 After the input cooling water absorbs the temperature of the furnace drum, the temperature rises to form high-temperature and high-pressure cooling water return water, and the high-temperature and high-pressure cooling water return water is output through the pipelines a0 and a in sequence, w...

Embodiment 2

[0071] Such as figure 2 As shown, this embodiment provides a method for utilizing heat energy in the production process of polysilicon, including the following steps S101-S104.

[0072] S101. Divide the return cooling water output from the reduction furnace cylinder into two parts, one part is sent to the flash tank, and the other part is sent to the front end of the inlet regulating valve of the cold water pump and the front end of the inlet regulating valve of the hot water pump.

[0073] In this embodiment, it is necessary to input cooling water (which may be referred to as cooling water) to the furnace drum of the reduction furnace to cool the furnace drum to ensure that the temperature of the equipment will not be too high and cause an accident. The input from the furnace drum of the reduction furnace After the cooling water absorbs the temperature of the furnace barrel, the temperature rises to form high-temperature and high-pressure cooling water return water, and the ...

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Abstract

The invention provides a thermal energy utilization system in the polysilicon production process, which includes a flash tank, a reduction furnace water pump, a cold water pump inlet regulating valve, a cold water pump, a cold water heat exchanger, a hot water pump inlet regulating valve and a hot water pump. Correspondingly, a method for utilizing heat energy in the polysilicon production process is provided. The invention can reduce or even avoid the consumption of high-temperature and high-pressure steam in the regeneration link of the adsorption column in the production process of polysilicon, thereby saving the operation cost.

Description

technical field [0001] The invention relates to the technical field of polysilicon production, in particular to a heat energy utilization system in the polysilicon production process and a heat energy utilization method in the polysilicon production process. Background technique [0002] Polysilicon is the building block material for the solar photovoltaic industry. At present, the production of polysilicon mainly adopts the modified Siemens method (that is, the reduction method of trichlorosilane), and its basic principle is: SiHCl 3 (Trichlorosilane: trichlorosilane, referred to as TCS) and H 2 As the raw material, the gas phase deposition reaction is carried out in the reduction furnace according to a certain ratio, and the electric heating carrier is used to make the reduction furnace reach the reaction temperature. The specific reaction temperature is 1080 ° C ~ 1100 ° C, and the polysilicon crystal particles produced are deposited on the silicon core. , so as to obta...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/03F22B1/18
CPCC01B33/03F22B1/1838
Inventor 王惠张伟宋高杰董越杰胡启红王兵
Owner XINTE ENERGY
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