Anisotropic conductive film and connection structure using the same
An anisotropic, conductive film technology, applied in the direction of conductive adhesives, conductive materials dispersed in non-conductive inorganic materials, film/sheet adhesives, etc., can solve performance reduction, short circuit or contact Increased resistance and other problems, to achieve excellent insulation performance and connection reliability
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example 1
[0088] 1. Formation of conductive layer
[0089] 20 wt% of bidifenole-type binder resin (FX-293, NipponSteel Chemical Co., Ltd., Tg: 165°C, molecular weight: 45,000), 10 wt% of epoxy resin 1 were mixed as the first inorganic filler. (Celloxide2021P, DAICEL), 5wt% epoxy resin 2 (YDPN 638, Kukdo Chemical Company), 2wt% cationic curing agent (SI-B3A, Sanshin Chemical Industry Co., Ltd.), conductive particles (KSFD, average particle diameter: 3.0 μm, NCI), 3 wt % of silica (R812, Tokuyama corporation) having a particle diameter of 7 nm, and 20 wt % of a particle diameter of 50 nm and surface-treated with phenylamine groups as a second inorganic filler Silica (YA050C, Admatech) was used to prepare the conductive layer composition. The conductive layer composition was coated on a release film, and then the solvent was volatilized using a drier at 70° C. for 5 minutes, thereby obtaining a dry conductive layer with a thickness of 6 μm.
[0090] 2. Formation of Dielectric Layer
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example 2
[0095] An anisotropic conductive film of Example 2 was produced in the same manner as in Example 1, except that silica (PM-20, Tokuyama) having a particle diameter of 14 nm was used as the first inorganic filler.
example 3
[0097] The anisotropic conductive film of Example 3 was produced in the same manner as in Example 1, except that silica (SC2030, Admatech) having a particle diameter of 500 nm and surface-treated with epoxy resin was used as the second inorganic filler except.
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