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A display substrate, its manufacturing method, and a display device

A technology for displaying substrates and substrates, which is applied in the manufacture of semiconductor devices, electrical solid state devices, and semiconductor/solid state devices. The number of carriers and the effect of improving the performance of display devices

Active Publication Date: 2021-03-19
KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

High-energy hot carriers are injected into the gate insulating layer. During the injection process, interface states and trapped charges will be generated, causing damage to the gate insulating layer.

Method used

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  • A display substrate, its manufacturing method, and a display device
  • A display substrate, its manufacturing method, and a display device
  • A display substrate, its manufacturing method, and a display device

Examples

Experimental program
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Effect test

no. 1 example

[0039] This embodiment provides a display device, including: several unit light emitting devices (not shown in the figure) and a display substrate for supplying power to each unit light emitting device.

[0040] In one embodiment, the display device is configured as an organic light emitting display device, and its unit light emitting device includes an anode, an organic layer and a cathode. The organic layer includes a hole injection layer, a hole transport layer, an organic light-emitting layer, an electron transport layer, and an electron injection layer stacked on the anode in sequence. The cathode is arranged on the upper surface of the electron injection layer. The anode and the cathode provide holes and electrons to the organic layer, respectively. The electron-hole pairs recombine in the organic light-emitting layer to generate excitons, and the excitons transition from the excited state to the ground state, release energy, and emit light of the corresponding color. ...

no. 2 example

[0080] refer to Figure 11 as well as Figure 12 , this embodiment is similar to the technical solution of the first embodiment, the difference is that:

[0081] The materials of the first conductive layer 400 and the second conductive layer 600 are different. There is no first insulating layer 510 formed between the second conductive layer 600 and the first conductive layer 400 , that is, the plate region 610 is in direct contact with the gate region 410 , thereby realizing electrical connection.

[0082] The material of the first conductive layer 400 is different from that of the second conductive layer 600, and when the first insulating layer 510 is not formed between the second conductive layer 600 and the first conductive layer 400, it can prevent the second conductive layer 600 from being patterned and engraved. During etching, the first conductive layer 400 is also etched, thereby preventing the device performance from being affected. Specifically, in this embodiment...

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Abstract

The invention provides a display substrate, a manufacturing method thereof, and a display device. The display substrate provided by the present invention includes a second conductive layer, and the second conductive layer includes a plate region formed on the upper surface of at least one gate region and electrically connected to the gate region. The orthographic projection of the polar plate region overlaps with the conductive region of the semiconductor layer, and the conductive region is located below the edge of the polar plate region in this part, which is not facing the interface between the channel region and the conductive region of the semiconductor layer. At the same time, the plate region is electrically connected to the gate region, so when the gate voltage is applied, the edge of the plate region is the edge of the electric field caused by the gate voltage. Therefore, the number of hot carriers generated at the interface between the channel region and the conductive region induced by the edge of the strong electric field of the gate voltage can be effectively reduced, the hot carrier effect can be reduced, and the performance of the display device can be improved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a display substrate, a manufacturing method thereof, and a display device. Background technique [0002] With the continuous development of display technology, various display devices are widely used in various fields such as mobile phones, computers, and televisions. The display substrate of the display device includes a semiconductor layer, a gate insulating layer, a gate layer, etc., and the semiconductor layer, the gate insulating layer, and the gate layer together form the thin film transistors of the driving circuit. During the manufacturing process of the display substrate, part of the semiconductor layer is ion-doped to form a source region, a drain region and a conductive channel region. The conductive channel region is not ion-doped, and its conductivity is weak; the source region and the drain region are heavily doped, and its conductivity is strong, which belongs to...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/12H01L27/32H01L21/77
CPCH01L27/124H01L27/1288H10K59/131
Inventor 秦旭张露韩珍珍胡思明朱晖
Owner KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD