Reverse conducting IGBT containing reverse side trench gates
A reverse-conducting, grooved gate technology, applied in semiconductor devices, electrical components, circuits, etc., can solve problems such as foldback, device power consumption, reliability impact, and snap-back
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[0030] The present invention will be described in detail below in conjunction with the accompanying drawings.
[0031] The main purpose of the present invention is to suppress the snap-back phenomenon of the RC-IGBT.
[0032] figure 1 It is a schematic diagram of an RC-IGBT cell structure of the present invention, which contains two types of groove gate structures. One is the grooved gate structure (consisting of 33 and 34) used to control the switch connected to the gate (G), and the other is the grooved gate structure (consisting of 12 and 35) for auxiliary depletion , where the insulating dielectric layers (34 and 35) can be SiO 2 The dielectric layer, used to control the conductor region (33) of the grooved gate structure of the switch can be heavily doped n-type or p-type polysilicon material, used to assist the depletion of the conductor region (12) of the grooved gate structure Can be heavily doped p-type polysilicon material. The first trench gate structure for as...
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