Manufacturing method of microfluidic chip
A technology of microfluidic chips and manufacturing methods, which is applied in fluid controllers, chemical instruments and methods, and laboratory containers, etc., which can solve the problems affecting the movement of liquid droplets, increasing the roughness of the dielectric layer, and the difficulty of liquid droplet movement, etc. question
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Embodiment 1
[0080] The first embodiment of the present invention provides a method for manufacturing a microfluidic chip, image 3 It is a schematic diagram of the hierarchical structure of the chip manufactured by the method of this embodiment; Figure 13 is the flow chart of the manufacturing method of the present embodiment;
[0081] like Figure 13 As shown, the manufacturing method of the microfluidic chip in this embodiment includes the following steps:
[0082] Step S1: Prepare a thin film as the dielectric layer 1. The purity, thickness, density and uniformity of the dielectric layer 1 directly determine whether the chip function can be realized. Therefore, the selection of the dielectric layer 1 is the most important and critical step in the entire chip manufacturing process. This embodiment uses Flexible film materials such as PVDF, PI, PET, PEN, PP, etc. or polymer films doped with various high dielectric constant impurities in these materials are used as the dielectric laye...
Embodiment 2
[0087] The second embodiment of the present invention provides a method for manufacturing a microfluidic chip, Figure 4 It is a schematic diagram of the level structure of the chip manufactured by the method of this embodiment; Figure 5 It is a schematic diagram of the hierarchical structure of the chip manufactured by the method of this embodiment. The second embodiment is a further improvement on the first embodiment, the main improvement is that, in the second embodiment of the present invention, see Figure 4-5 As shown, the circuit layer 2 formed in step S2 includes the electrode layer 21 and the wire layer 23 , and the electrode layer 21 and the wire layer 23 are in the same layer in the form of co-layering.
[0088] The electrode layer 21 is composed of two rows of single electrodes designed side by side. The distance between the single electrodes should be the minimum distance that can be achieved by the process used. Adjacent single electrodes cannot apply voltage...
Embodiment 3
[0091] The third embodiment of the present invention provides a method for manufacturing a microfluidic chip. Figure 6-8 It is a schematic diagram of the level structure of the chip manufactured by the method of this embodiment; Figure 9 It is a schematic diagram of the hierarchical structure of the chip manufactured by the method of this embodiment. The third embodiment is a further improvement on the first embodiment. The main improvement is that in the third embodiment of the present invention, in step S2, an electrode layer 21, an insulating layer 22 and wires are sequentially formed on the PI film. The layer 23, the electrode layer 21, the insulating layer 22, and the wire layer 23 collectively constitute the circuit layer 2 and are formed in a stacked form as a multilayer structure. see Image 6 As shown, the electrode layer 21 is composed of three rows and three columns of square single electrode arrays, and the horizontal and vertical distances between the electrod...
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Abstract
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