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Method for making standard leakage holes based on defects of graphene itself

A standard leak and graphene technology, applied in chemical instruments and methods, testing of fluid tightness, testing of machine/structural components, etc. Narrow rate range and other issues, to achieve the effect of good controllability of leak rate, low cost and wide leak rate range

Inactive Publication Date: 2018-09-07
HEFEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The size of these two standard leak holes is difficult to control precisely, the controllability of the leak rate is poor, and the leak rate range is narrow, making it difficult to measure a small leak rate

Method used

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  • Method for making standard leakage holes based on defects of graphene itself
  • Method for making standard leakage holes based on defects of graphene itself
  • Method for making standard leakage holes based on defects of graphene itself

Examples

Experimental program
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Effect test

Embodiment 1

[0029] In this example, the method for making a standard leak by utilizing the defects of graphene itself is as follows:

[0030] 1. Take a piece of copper foil 2 and put it into a vacuum tube furnace. First, use methane and hydrogen to clean the pipeline in the vacuum tube furnace, vacuumize it to about 10Pa, then raise the temperature to 1020°C for half an hour, heat preservation and annealing for 60 minutes, and control the hydrogen and hydrogen. The content of methane is used to grow graphene, and finally, after the growth is completed, the temperature is rapidly lowered, and after the temperature is cooled, a single layer of graphene is deposited on the surface of copper foil to obtain a single layer of graphene 1;

[0031] 2. Evenly spin-coat polymethyl methacrylate 3 on the prepared graphene. The homogenizer first slows down at 800r / s for 5s, then fast at 3000r / s for 10s, and measures the thickness of polymethyl methacrylate 355nm.

[0032] 3. Take a silicon wafer, use...

Embodiment 2

[0038] The operation process of this example is basically the same as Example 1. The difference is that after step 5 is completed, a layer of graphene / polymethyl methacrylate is transferred on it, and a double-layer graphene / polymethyl methacrylate is obtained after drying. The structure of methyl acrylate. Compared with the single layer, it is found that the flow rate of the double layer is about an order of magnitude larger than that of the single layer, the test pressure ranges from 1000Pa to 7000Pa, and the minimum leak rate is negative eight orders of magnitude.

Embodiment 3

[0040] The operation process of this example is basically the same as that of Example 1. The difference is that after step 5 is completed, the second sheet of graphene is cleaned and spread on the first layer, baked for about 20 minutes, then removes the polymethyl methacrylate, and then repeats Repeat the above steps until five layers are covered. Note that the polymethyl methacrylate on the fifth layer is not removed, just dry it. Compared with the structure of bilayer graphene / polymethyl methacrylate, it is found that the flow rate of the five layers is about two orders of magnitude larger than that of the two layers, the test pressure ranges from 1000Pa to 7000Pa, and the minimum leak rate is negative six orders of magnitude.

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Abstract

The invention discloses a method for making standard leakage holes based on defects of graphene itself. Firstly, single-layer graphene is made on a copper foil and is coated with a layer of polymethylmethacrylate, the copper foil is removed by using copper corrosion liquid, then the graphene is put on a punched silicon wafer, drying is performed for about 1 hour to complete graphene transfer, finally the silicon wafer is put on a KF40 sealing flange, the periphery of the silicon wafer is uniformly coated with Torr-Seal adhesive, standing is performed for more 12 hours for solidification, andstandard leakage holes of the single-layer graphene are made. By adopting the method for making standard leakage holes based on defects of graphene itself, the size of channels can be controlled by controlling the layer number of graphene, and the standard leakage holes needing leakage rate are obtained. Therefore, the leakage rate of the standard leakage holes is good in controllability, the leakage rate range is wide, micro leakage rate measurement can be achieved, and it can be ensured that gas in the channels is located in a molecular flow state.

Description

technical field [0001] The invention relates to a standard leak hole and a manufacturing method thereof, in particular to a standard leak hole based on the defects of graphene itself and a manufacturing method thereof. Background technique [0002] In recent years, graphene has attracted widespread attention due to its good mechanical properties, permeability properties and chemical stability. Graphene is a simple substance of carbon formed by the neat arrangement of carbon atoms in a hexagonal lattice. The connection between each carbon atom is very flexible. When an external force is applied, the surface of the carbon atom will bend and deform, and the carbon atoms do not need to be rearranged to adapt to the external force. The stability of the structure is maintained. At present, there are two main directions for using graphene or graphene oxide to conduct gas permeation and separation research. The first is to use the defects of graphene or graphene oxide itself during...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M3/00C01B32/194
CPCC01B32/194G01M3/007
Inventor 王旭迪姜彪王永健尉伟杨丹邱克强魏本猛寇钰
Owner HEFEI UNIV OF TECH