Substrate adsorption apparatus with foreign body detection device and foreign body detection method

Abstract

The invention provides a substrate adsorption device with a foreign body detection device and a foreign body detection method. The substrate adsorption appratus with the foreign body detection deviceis provided with a foreign body detection device on one side of a vacuum adsorption platform, The foreign body detection device can emit a detection signal and judge whether foreign bodies exist on the back surface of the substrate according to the reflection condition of the detection signal, thereby detecting foreign bodies on the back surface of the substrate before vacuum adsorption, and preventing defective manufacturing process or fragmentation caused by foreign bodies.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a substrate adsorption device with a foreign matter detection device and a foreign matter detection method. Background technique [0002] With the development of display technology, liquid crystal displays (Liquid Crystal Display, LCD) and organic light-emitting diode displays (Organic Light-Emitting Diode, OLED) and other flat display devices have high image quality, power saving, thin body and wide application range. and other advantages, and are widely used in various consumer electronic products such as mobile phones, televisions, personal digital assistants, digital cameras, notebook computers, and desktop computers, and become the mainstream of display devices. [0003] Taking the liquid crystal display panel as an example, the liquid crystal display panel usually consists of a color filter substrate (CF, Color Filter), a thin film transistor substrate (TFT, Thin Film Tran...

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Problems solved by technology

[0005] In the prior art, before photoresist coating and substrate exposure, foreign objects are usually detected on the front of the substrate through photoelectric sensors to prevent foreign objects from affecting the process yield, but there is a lack of detection of foreign objects that may exist on the back of the substrate, but in fact Foreign matter on the back of the substrate will also have a negative impact on the process yield. Specifically, when the substrate is vacuum adsorbed, due to the influence of foreign matter on the back of the substrate, vacuum adsorption may fail or the degree of vacuum adsorption may be inconsistent, resulting in differences in the height of each part of the substrate. , affect the coating and exposure accuracy, when the particle size of the foreign matter is large, fragments may occur due to the uneven stress on the substrate area during vacuum suction, which will cause damage to the machine mechanism and affect the production capacity.

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