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Aluminoborosilicate glass and preparation method thereof

A boroaluminosilicate and glass technology, applied in the field of boroaluminosilicate glass and its preparation, can solve problems such as low bonding strength and rapid bonding

Active Publication Date: 2019-01-01
CSG HOLDING +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Based on this, it is necessary to provide a boroaluminosilicate glass and its preparation method for the problem that the glass commonly used in anodic bonding cannot achieve fast bonding at low temperature and low pressure, and the bonding strength is not high.

Method used

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  • Aluminoborosilicate glass and preparation method thereof
  • Aluminoborosilicate glass and preparation method thereof
  • Aluminoborosilicate glass and preparation method thereof

Examples

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preparation example Construction

[0076] see figure 1 , the preparation method of the boroaluminosilicate glass of an embodiment, comprises the following steps:

[0077] S110. Weigh the corresponding raw materials according to the mass percentage of oxides, mix them evenly, and perform clarification treatment to obtain glass paste.

[0078] In one of the embodiments, the raw material includes 61.0% to 85.0% of SiO according to the mass percentage of the following oxide basis: 2 , 2.5% to 17.5% Al 2 o 3 , 2% to 20.5% of B 2 o 3 , 0.01% to 4.5% Li 2 O, 0.01% to 4.0% Na 2 O and 0.01%~2.0% K 2 O.

[0079] In one embodiment, 0-3.0% of MgO, 0-4.5% of CaO, 0-2.5% of SrO, 0-3.0% of BaO, 0-2.0% of ZnO and 0-0.5% of SnO are simultaneously added 2 After uniform mixing, clarification treatment is carried out to obtain glass slurry.

[0080] In one embodiment, the temperature of the clarification treatment is 1600° C. to 1640° C.; the time of the clarification treatment is 4h to 6h.

[0081] In one embodiment, t...

Embodiment 1～10

[0100] The boroaluminosilicate glass of Examples 1-10 weighed the corresponding raw materials according to the proportions in Table 2, mixed them well, put them into a Pt crucible, and carried out a clarification treatment at 1620°C for 6 hours in a high-temperature electric furnace , Stir at a rate of 20rpm / min during the clarification process; then lower the temperature to 1550°C to homogenize the glass slurry, and the homogenization time is 1h; pour the glass slurry into a preheated cast iron mold The glass blank was solidified and formed in the middle; then the glass blank was annealed at 560° C. for 4 hours, and then naturally cooled to room temperature.

[0101] After the annealed boroaluminosilicate glass is cold cut, ground, CNC, and polished, a cylindrical sample with a size of φ5*50mm is obtained. The surface roughness is controlled below 1nm, and the thickness uniformity TTV is controlled within 3μm. For thermal performance test, the thermal expansion curve was meas...

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Abstract

The invention relates to an aluminoborosilicate glass and a preparation method thereof. The aluminoborosilicate glass comprises the following components by mass percentage by taking oxide as a reference: 61.0% to 85.0% SiO2, 2.5% to 17.5% Al2O3, 2% to 20.5 % of B2O3, 0.01% to 4.5% of Li2O, 0.01% to 4.0% of Na2O, and 0.01% to 2.0% of K2O; The bonding factor delta of the aluminoborosilicate glass is0.05-0.45, and a calculation formula of the bonding factor delta is: delta=MuLi*MLi+MuNa*MNa+MuK*MK; wherein, MuLi=(1 / rLi)<2>, MuNa=(1 / rNa)<2>, MuK=(1 / rK)<2>; MLi=100*WLi / MrLi, MNa=100*WNa / MrNa, andMK=100*WK / MrK; rLi, rNa and rK correspond to the ionic radius of Li, Na and K respectively, and WLi, WNa and WK respectively correspond to the mass percentages of Li2O, Na2O and K2O in the aluminoborosilicate glass, and MrLi, MrNa and MrK correspond to the relative molecular masses of Li2O, Na2O and K2O in the aluminoborosilicate glass respectively. The above aluminoborosilicate glass system is infavor of achieving rapid anodic bonding at low temperature and low pressure, and is in favor of increasing the bonding tension between the aluminoborosilicate glass and a silicon chip.

Description

technical field [0001] The invention relates to the technical field of glass preparation, in particular to boroaluminosilicate glass and a preparation method thereof. Background technique [0002] At present, with the rapid development of electronic information equipment, there is an increasing demand for low-alkali borosilicate glass substrates for anodic bonding and electronic display. A common bonding technique used in industries such as MEMS sensors and microfluidics is anodic bonding. The basic process of anodic bonding is the electrochemical reaction process. Under the dual effects of heat and electricity, the alkali metal ions (mainly Na+) in the glass move from the vicinity of the anode to the cathode, and a polarized alkali metal ion depletion layer is generated near the interface between the glass and the anode. The high-strength electric field generates a huge electrostatic field attraction at the interface between the anode silicon (or metal) and the glass, dri...

Claims

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Application Information

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IPC IPC(8): C03C3/093C03C3/091
CPCC03C3/091C03C3/093
Inventor 平文亮
Owner CSG HOLDING