Nano-imprinting method and nano-imprinting device
A technology of nanoimprinting and embossing glue, which is applied in the fields of optics, optomechanical equipment, instruments, etc., can solve the problems that the imprinting glue cannot completely fill the mold cavity, imprinting defects, and affect the quality of imprinting, so as to eliminate defects, Improved quality, simple and feasible operation
Inactive Publication Date: 2019-01-01
BOE TECH GRP CO LTD
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However, when nanoimprinting is performed in air, air is usually trapped in the mold cavity, resulting in the generation of bubble defects, and the imprinting glue cannot completely fill the mold cavity, resulting in imprint defects and affecting the imprint quality
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[0040] In order to make the technical problems, technical solutions and advantages to be solved by the embodiments of the present invention clearer, the following will describe in detail with reference to the drawings and specific embodiments.
[0041] When performing nanoimprinting, such as figure 1 As shown, on the film layer 1 to be made of the substrate, the embossing glue 2 is coated, and then as figure 2 As shown, the nano-imprint template 3 is imprinted on the imprint adhesive 2, so that the pattern of the nano-imprint template 3 can be transferred to the imprint adhesive 2, wherein the imprint adhesive 2 cannot be completely removed to prevent The nanoimprint template 3 is in direct contact with the film layer 1 to be produced, which damages the nanoimprint template 3 . later as image 3 As shown, the imprint glue 2 is cured by using ultraviolet light 5, such as Figure 4 As shown, after the imprinting adhesive 2 is cured, the nano-imprint template 3 is released f...
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Abstract
The invention provides a nano-imprinting method and a nano-imprinting device, belonging to the technical field of display. The nano-imprinting method comprises the following steps: coating a film layer to be manufactured of a substrate with imprinting adhesive, wherein the substrate is located in an imprinting chamber; filling a preset gas into the imprinting chamber, and impressing a nano-imprinting template on the imprinting glue at a temperature above a boiling point of the preset gas; lowering the ambient temperature of the imprinting chamber to below the boiling point of the preset gas, and maintaining for a preset time, so that the preset gas turns into liquid; irradiating ultraviolet light from one side of the nano-imprinting template remote from the imprinting adhesive, so that theimprinting adhesive is cured; raising the ambient temperature of the imprinting chamber to above the boiling point of the preset gas, so that the liquefied preset gas turns into gas again; and demolding the nano-imprinting template from the imprinting adhesive. The technical scheme of the invention can improve the quality of nano-imprinting.
Description
technical field [0001] The invention relates to the field of display technology, in particular to a nanoimprint method and a nanoimprint device. Background technique [0002] Nanoimprint technology has the advantages of high resolution, simple process, ultra-low cost, and high productivity, and is widely used in micro-nano manufacturing fields such as LEDs (light-emitting diodes) and semiconductors. [0003] UV nanoimprinting, which completes the mold forming process by simple UV exposure, is considered to be one of the most promising next-generation photolithography technologies. However, when nanoimprinting is performed in air, air is usually trapped in the mold cavity, resulting in the generation of bubble defects, and the imprint glue cannot completely fill the mold cavity, resulting in imprint defects and affecting the imprint quality. Contents of the invention [0004] The technical problem to be solved by the present invention is to provide a nanoimprinting method ...
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IPC IPC(8): G03F7/00
CPCG03F7/0002
Inventor 路彦辉谷新郭康刘震张笑谭伟
Owner BOE TECH GRP CO LTD