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Preparation method for macromolecular nanometer bowl structure

A polymer and nanobowl technology, applied in the direction of nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the problems of low fidelity of transfer graphics, microstructure fracture, time-consuming processing, etc., to achieve The effect of short preparation cycle, complete microstructure and low cost

Inactive Publication Date: 2019-01-18
GUIZHOU EDUCATION UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in nanoimprint technology, if the filling degree of the imprinting process is not complete, the fidelity of the transfer pattern will be low, and due to the adhesion between the mask and the transfer medium, if the stress is too large, the microstructure is prone to fracture and damage. Incomplete phenomena, electron or ion beam lithography are expensive equipment, time-consuming processing, and difficult to achieve three-dimensional structures and large-area (tens of microns to hundreds of microns) pattern structure processing, these shortcomings limit these wide application of the method

Method used

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  • Preparation method for macromolecular nanometer bowl structure
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Embodiment 1

[0018] A method for preparing a polymer nanobowl structure, comprising the steps of:

[0019] (1) Preparation of the mixed solution: mix polymethyl methacrylate powder with a molar mass of 50 kg / mol and a degree of dispersion of 1.1 with polystyrene powder with a molar mass of 48 kg / mol and a degree of dispersion of 1.02 by 1: Mix at a mass ratio of 9; add 1 mg of mixed powder per 1 ml of toluene to obtain a 1 mg / ml mixed polymer toluene solution;

[0020] (2) Treatment of silicon wafers: cut the circular single crystal silicon wafers into square silicon wafers with a size of 1×1 cm, and place the cut silicon wafers in a 80% H 2 SO 4 , 30%H 2 o 2 and deionized water according to the volume ratio of 100:35:15 in the cleaning solution made of 70 ° C for 32 minutes, then rinse with deionized water, put it into a plastic beaker, use 20% hydrofluoric acid and deionized The hydrofluoric acid solution prepared by water at a ratio of 1:1 removes the oxide layer on the silicon waf...

Embodiment 2

[0026] A method for preparing a polymer nanobowl structure, comprising the steps of:

[0027] (1) Preparation of the mixed solution: mix polymethyl methacrylate powder with a molar mass of 50 kg / mol and a degree of dispersion of 1.1 with polystyrene powder with a molar mass of 48 kg / mol and a degree of dispersion of 1.02 by 2: Mix at a mass ratio of 8; add 3 mg of mixed powder per 1 ml of toluene to obtain a 3 mg / ml mixed polymer toluene solution;

[0028] (2) Treatment of silicon wafers: cut the circular single crystal silicon wafers into square silicon wafers with a size of 1×1 cm, and place the cut silicon wafers in a 80% H 2 SO 4 , 30%H 2 o 2 and deionized water at a volume ratio of 100:35:15, boiled at 80˚C for 30 minutes, then rinsed with deionized water, put them in a plastic beaker, and washed with 20% hydrofluoric acid and deionized The hydrofluoric acid solution prepared by water at a ratio of 1:1 removes the oxide layer on the silicon wafer, rinses it with deio...

Embodiment 3

[0034] A method for preparing a polymer nanobowl structure, comprising the steps of:

[0035] (1) Preparation of mixed solution: mix polymethyl methacrylate powder with a molar mass of 50 kg / mol and a degree of dispersion of 1.1 with polystyrene powder with a molar mass of 48 kg / mol and a degree of dispersion of 1.02 by 3: Mix at a mass ratio of 7; add 5 mg of mixed powder per 1 ml of toluene to obtain a 5 mg / ml mixed polymer toluene solution;

[0036] (2) Treatment of silicon wafers: cut the circular single crystal silicon wafers into square silicon wafers with a size of 1×1 cm, and place the cut silicon wafers in a 80% H 2 SO 4 , 30%H 2 o 2 and deionized water according to the volume ratio of 100:35:15 in the cleaning solution made of 90 ° C for 28 minutes, then rinse with deionized water, put it into a plastic beaker, and use 20% hydrofluoric acid and deionized The hydrofluoric acid solution prepared by water at a ratio of 1:1 removes the oxide layer on the silicon waf...

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Abstract

The invention discloses a preparation method for a macromolecular nanometer bowl structure. The macromolecular nanometer bowl structure with even particle size distribution is prepared by dehumidifying a mixed film of polystyrene and polymethyl methacrylate in a mixed solvent of butanone, acetone and water at volume ratio of 7:3:15 according to the steps of preparing a mixed solution, treating a silicon wafer, preparing the film, drying the film, dehumidifying, etching, and the like. According to the invention, an unconventional dehumidifying technology-macromolecular mixed film dehumidifyingprocess in solvent is utilized to selectively etch the dehumidified macromolecular film with the solvent, so that the large-area macromolecular film can be etched and the prepared nanometer bowl structure has structural integrity and uniform distribution. The method has the advantages of large area, high repeatability, complete microstructure, short preparation period, low cost, simplicity in operation, and the like.

Description

technical field [0001] The invention belongs to the technical field of polymer materials, and in particular relates to a preparation method of a polymer nanobowl structure. Background technique [0002] The construction of surface and interface morphology and structure is of great significance to the improvement of material properties. In recent years, with the rapid development of nanotechnology, the research on the construction of the surface and interface structure of polymer materials has also made rapid progress. Polymeric isotropic nanostructures, such as nanospheres, have been successfully prepared in many simple ways. Although some nanofabrication methods, such as nanoimprinting and electron or ion beam lithography, have successfully prepared three-dimensional complex structures of polymers, such as nanobowls. However, in nanoimprint technology, if the filling degree of the imprinting process is not complete, the fidelity of the transfer pattern will be low, and ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08J5/18C08J7/00C08J9/26C08L33/12B82Y30/00B82Y40/00
CPCC08J5/18B82Y30/00B82Y40/00C08J7/00C08J9/26C08J2333/12
Inventor 徐林赵雪宇陈正件张欢欢
Owner GUIZHOU EDUCATION UNIV