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Zr-Cu-Al-Ti metallic glass film capable of controlling reflectivity

A zr-cu-al-ti, metallic glass technology, applied in metal material coating process, sputtering plating, ion implantation plating and other directions, can solve the problems of time-consuming, high cost, small change range, etc. To achieve the effect of wide application prospects

Active Publication Date: 2019-02-22
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Some scholars have previously stated that annealing the metallic glass film below the glass transition temperature can slightly increase the reflectivity of the metallic glass film, but the change is small and takes too long and the cost is too high to meet the needs of actual production.

Method used

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  • Zr-Cu-Al-Ti metallic glass film capable of controlling reflectivity
  • Zr-Cu-Al-Ti metallic glass film capable of controlling reflectivity

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] 1) The target will be synthesized by using Zr, Cu, Al and Ti metal raw materials with a mass purity greater than 98%. The nominal ratio of Zr, Cu, Al, and Ti is 46.5at%, 45at%, 7at%, 1.5at%, and Put in the ultimate vacuum of 6.7×10 -8 On the target position of Pa's multi-target magnetron sputtering coating equipment, the substrate of the target sputtering film is a silicon single-sided polished wafer with a diameter of 25.4 mm, a thickness of 1 mm, and a root mean square roughness of 0.6 nm. The crystal plane direction of the silicon single-sided is (100); the polishing surface of the single-sided silicon polishing sheet is facing down, and the target is adjusted so that the distance from the target surface to the polishing sheet is 140 mm.

[0025] 2) Vacuum the sputtering chamber cavity of the multi-target magnetron sputtering coating equipment to a pressure of 5.0×10 in the cavity -7 Pa, adjust the substrate temperature to 25°C, then fill in high-purity argon with a volu...

Embodiment 2

[0031] 1) The target will be synthesized by using Zr, Cu, Al and Ti metal raw materials with a mass purity greater than 98%. The nominal ratio of Zr, Cu, Al, and Ti is 46.5at%, 45at%, 7at%, 1.5at%, and Put in the ultimate vacuum of 6.7×10 -8 On the target position of Pa's multi-target magnetron sputtering coating equipment, the substrate of the target sputtering film is a silicon single-sided polished wafer with a diameter of 25.4 mm, a thickness of 1 mm, and a root mean square roughness of 0.6 nm. The crystal plane direction of the silicon single-sided is (100); the polishing surface of the single-sided silicon polishing sheet is facing down, and the target is adjusted so that the distance from the target surface to the polishing sheet is 140 mm.

[0032] 2) Vacuum the sputtering chamber cavity of the multi-target magnetron sputtering coating equipment to a pressure of 5.0×10 in the cavity -7 Pa, adjust the substrate temperature to 100°C, then fill in high-purity argon with a vol...

Embodiment 3

[0038] 1) The target will be synthesized by using Zr, Cu, Al and Ti metal raw materials with a mass purity greater than 98%. The nominal ratio of Zr, Cu, Al, and Ti is 46.5at%, 45at%, 7at%, 1.5at%, and Put in the ultimate vacuum of 6.7×10 -8 On the target position of Pa's multi-target magnetron sputtering coating equipment, the substrate of the target sputtering film is a silicon single-sided polished wafer with a diameter of 25.4 mm, a thickness of 1 mm, and a root mean square roughness of 0.6 nm. The crystal plane direction of the silicon single-sided is (100); the silicon single-sided polished wafer is placed on the substrate holder with the polishing surface facing down, and the target is adjusted so that the distance between the target surface and the polished wafer is 140 mm.

[0039] 2) Vacuum the sputtering chamber cavity of the multi-target magnetron sputtering coating equipment to a pressure of 5.0×10 in the cavity -7 Pa, adjust the substrate temperature to 200 DEG C, th...

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Abstract

The invention discloses a method for controlling the optical properties of a Zr-Cu-Al-Ti metallic glass film. The method comprises the steps that Zr, Cu, Al and Ti metallic raw materials are synthesized into a target material to be put at a target position of multi-target magnetron sputtering coating equipment; a silicon single-face polishing sheet is adopted as a substrate and installed on a substrate frame, and the distance from the substrate frame to the target position is adjusted; a cavity is vacuumized, the substrate temperature is adjusted to the appropriate temperature, then argon is introduced into the cavity, the air pressure in the cavity is adjusted, and sputtering is conducted for a certain time; the silicon single-face polishing sheet obtained after sputtering is taken out, and the Zr-Cu-Al-Ti metallic glass film with different substrate temperatures is obtained. The prepared metallic glass film with the different substrate temperatures has the distinctly different optical properties in the visible spectrum and especially has the obvious critical temperature, the metallic glass film at the high temperature is high in reflectivity and can serve as a coating material, and the metallic glass film at the low temperature is low in reflectivity and can serve as a good light absorption material. The metallic glass film can be applied to the fields of optical windows, micro electro-mechanical systems, microscopes and solar cells and has the wide application prospect by serving as a functional element.

Description

Technical field [0001] The invention relates to a metallic glass film, in particular to a Zr-Cu-Al-Ti metallic glass film with adjustable reflectivity properties. Background technique [0002] In the 1860s, amorphous alloys, that is, metallic glass, entered people's field of vision. Because of its unique structure and excellent performance different from traditional crystalline alloys, metallic glass received extensive attention from researchers. In the past thirty years, the research and development of bulk metallic glass has been very vigorous, but when metallic glass is deformed, shear bands are very easy to appear and concentrated deformation will cause material failure. However, when the size of metallic glass is reduced to the nanometer level, such as metallic glass film, the deformation mode is very easy to transform into uniform deformation, and thermodynamics and other aspects will appear completely different from the bulk metallic glass size effect. In-depth study of m...

Claims

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Application Information

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IPC IPC(8): C23C14/18C23C14/35
CPCC23C14/185C23C14/35
Inventor 蒋建中孙丽娟曹庆平张冬仙王晓东
Owner ZHEJIANG UNIV