Dense twill and fabric anti-weft skew processing method with slub effect

Abstract

The invention belongs to the field of fabric processing, and in particular relates to a fabric anti-weft oblique processing method with thick twill and slub effect. The specific technical solution adopted is: a fabric anti-weft deflection processing method, comprising protecting the non-processed surface of the fabric with a film, the film is an easy-to-tear film, and the stretchability of the film is less than that of the fabric. Extensibility. The present invention starts from the source of weft skew, and creatively shapes the fabric coating first, and then performs subsequent printing processing, thereby providing a brand-new idea for preventing fabric weft skew. The invention also provides an easy-to-tear protective film, which can be attached to a relatively rough surface such as a fabric, and the protective film has poor ductility and stretchability, and will not be deformed in the process of external forces such as printing, providing reliable protection for the fabric. At the same time, the protective film is easy to remove after use, there will be no adhesive residue after removal, and it will not affect the properties of the fabric itself.

Description

technical field [0001] The invention belongs to the field of fabric processing, and in particular relates to a fabric anti-weft oblique processing method with thick twill and slub effect. Background technique [0002] During the printing process, due to the continuous traction of the fabric and the influence of various mechanical movements and production operations, the weft yarn is prone to be skewed or distorted, that is, the weft is skewed, resulting in the final processed finished pattern not being parallel to the edge of the fabric, affecting The quality of the fabric needs to be cut flat when using it, resulting in a lot of waste. [0003] Most of the existing weft adjusting devices are photoelectric weft adjusting devices. There are four sets of sensors on the photoelectric weft adjusting device. Each set of sensors includes two parts: light-emitting and light-sensitive. The weft skew of the cloth can be measured through the photoelectric effect. The action adjustmen...

AI Technical Summary

Problems solved by technology

[0004] The photoelectric weft adjustment device can indeed completely avoid the occurrence of weft skew defects for fabrics that are prone to produce interference fringes that can be seen in light, but for denim fabrics and slub yarns with slub effects in the weft direction, irregular draft yarns, dancers, etc. Special silk fabrics such as dragon silk will inevitably produce detection blind spots; on the one hand, denim fabrics are not easy to produce light interference effects, even if interference effects are produced, the effect is not very ideal, and the conversion of images into electrical pulse signals is not strong enough , so that the detection of weft inclination becomes a blind spot; on the other hand, due to the use of special silk yarns such as slub yarns with slub effects, irregular draft yarns, and dragon dance yarns in the weft direction of some fabrics, the slub effect yarns, Irregular draft yarn, dragon dance yarn and other special yarns are detected as false images, so that the adjustment of weft skew takes the slub effect yarn as the adjustment object, thus becoming a blind spot in the real sense. Skew state

Therefore, for this kind of fabric, the traditional weft adjustment device does not play a big role, and a new method of preventing weft skew is urgently needed

Images