Fabrication method of microstructure, light modulation device, backlight source, display device

Abstract

The invention provides a method for fabricating a microstructure, comprising: fabricating a light-transmitting structure, the light-transmitting structure comprising a light-transmitting substrate and a micro-protrusion layer formed on the light-transmitting substrate, the micro-protrusion layer comprising a plurality of Light-transmitting micro-protrusions arranged at intervals, the size of the micro-protrusions is nanoscale; an insulating spacer layer is formed on the top surface of the micro-protrusions; the surface of the transparent substrate is not covered by the micro-protrusions A reflective layer is formed on the areas covered by the protrusions and on the sides of the micro protrusions. Correspondingly, the present invention also provides a light modulation device, a backlight source and a display device. The invention can accurately remove the metal reflective layer on the top surface of the micro-protrusion.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for manufacturing a microstructure, a light modulation device, a backlight source, and a display device. Background technique [0002] Micro-nanostructures play an important role in optoelectronic displays. For example, micro-nanostructures can be used in optical modulation films for optical modulation. like figure 1 What is shown is a schematic diagram of a partial structure of a light guide plate simulated in the prior art. Micro-nano protrusions 11 are formed on the light-emitting surface of the light guide plate 10, and there are no micro-nano protrusions on the side walls of the micro-nano protrusions 11 and the light-emitting surface. When the part covered by the micro-nano protrusions 11 forms the reflective layer 13, and the top of the micro-nano protrusions 11 is not provided with the reflective layer 13, this can make the outgoing light of the light guide pla...

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Problems solved by technology

[0003] The preparation of micro-nanostructures in the prior art is usually based on the LIGA (Lithographie, Galvanoformung and Abformung, that is, photolithography, electroforming and injection molding) process. figure 1 structure in , first make Figure 2a The mold 12 in the mold, and then use the mold 12 to carry out embossing and demoulding on the plastic body to form Figure 2b The structure in , and then form the whole layer of metal reflective layer 13 by sputtering, such as Figure 2c As shown, however, in order to allow light to enter the interior of the micro-nano protrusions 11, it is necessary to perform a sharpening process to remove the metal on the top of the micro-nano protrusions 11, but it is currently difficult to remove the metal on the top of the micro-nano protrusions 11, and it is difficult to form figure 1 structure in

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