Method of one-dimensional co-assembly by micron and/or nanoparticles with different particle sizes, substrate and application
A nanoparticle and co-assembly technology, which is applied in the direction of nanotechnology, nanotechnology, and nanotechnology for materials and surface science, can solve problems such as harsh conditions, high particle requirements, and poor patterning effects, and achieve more patterned patterns. , the effect of pattern refinement
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0098] Select the silicon wafer, adopt the mask optical etching method, etch the surface of the silicon wafer to have a prominent linear column array structure (such as Figure 2a shown) as the first substrate, in which each linear column array unit is 200 μm (C) × 12 μm (H) × 3 μm (W), choose a silicon wafer with a flat surface as the second substrate, use ethanol and ultrapure The second substrate was ultrasonically cleaned with water for 10 minutes, and then dried with nitrogen gas for later use. Mix polystyrene colloidal particles with a particle size of 1.8 μm and polystyrene colloidal particles with a particle size of 0.3 μm at a mass ratio of 2:1 to prepare dodecylbenzenesulfonate with a mass fraction of nanoparticles of 0.5%. Sodium acid is 0.1%, water is 99.4% mixed suspension. The surfaces of the first substrate and the second substrate were treated with a surface plasma surface treatment instrument (manufactured by Alcatel, model 601E) with a power of 80W for 60s. ...
Embodiment 2
[0101] Select a quartz plate, and use mask optical etching to etch a prominent curved column array structure on the surface of the quartz plate (such as Figure 2bshown) as the first substrate, wherein each curved column is 200 μm (C) × 10 μm (H) × 2 μm (W), the C of the curved column refers to the total length of each curved column, and the quartz with a flat surface is selected The sheet was used as the second substrate, and the second substrate was ultrasonically cleaned with ethanol and ultrapure water for 10 minutes and then dried with nitrogen gas for later use. CdSe quantum dots with a particle size of 2 μm are used as the core, the core is coated with silica core-shell particles, and CdSe quantum dots with a particle size of 0.2 μm are used as the core, and the core is coated with a shell core of silica The particles of the structure were mixed according to the mass ratio of 3:1 to prepare a mixed suspension with a mass fraction of micron and nano particles of 0.3%, so...
Embodiment 3
[0104] Choose the PDMS film, adopt the method of mask optical etching, etch out the array structure (such as Figure 2c shown) as the first substrate, wherein each array unit composed of straight columns and curved columns is 200 μm (C)×10.2 μm (H)×3.4 μm (W). A PDMS membrane with a flat surface was selected as the second substrate, and the second substrate was ultrasonically cleaned with ethanol and ultrapure water for 10 minutes and then dried with nitrogen gas for later use. Mix polystyrene microspheres with a particle size of 2 μm and silicon dioxide microspheres with a particle size of 0.84 μm and a mass ratio of 2:1 to prepare a particle with a mass fraction of microns and nanoparticles. 5%, stearic acid 0.3%, water 94.7% mixed suspension. The surfaces of the first substrate and the second substrate were treated with 80W power of a surface plasma surface treatment instrument for 60s. Take 2.5 μL of the suspension and drop it on the surface of the first substrate of 5mm...
PUM
| Property | Measurement | Unit |
|---|---|---|
| Particle size | aaaaa | aaaaa |
| Height h | aaaaa | aaaaa |
| Width w | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More